| GFAB Ref |
Category |
OEM |
Model |
Tool/Description |
Qty |
Wafer size |
| GFab003264 |
PhotoLithography |
ASML |
AT1100B Twinscan |
|
1 |
300mm |
| GFab003265 |
PhotoLithography |
Axcelis |
HC3 Ultra 5.5 |
13 wafer batch, 4 PDOs, full
300mm factory automation, excellent condition |
1 |
300mm |
| GFab003267 |
PhotoLithography |
Canon |
FPA 3000 EX4 |
Excimer Laser CYMER ELS5300 with
BDU underground; Pellicle Particle Checker;Power Supply Voltage AC 208V /
50Hz; Active damper,Carrier station Double,Wafer Inline Unit left, Reticle
Library "Nikon type" |
1 |
200mm |
| GFab003027 |
PhotoLithography |
CANON |
MAS-8000 |
Plasma
Photoresist Stripper, 5ea |
5 |
|
| GFab003049 |
PhotoLithography |
CANON |
MAS-8000 |
Plasma Photoresist Stripper, 2ea |
1 |
|
| GFab003532 |
PhotoLithography |
DNS |
200SKW |
2 Coater, 2 Developer |
1 |
200 |
| GFab003052 |
PhotoLithography |
DNS |
SC-W80A |
SOG Coating Tool for 200mm
Wafers |
1 |
200 |
| GFab003053 |
PhotoLithography |
DNS |
SC-W80A-AVFG |
SOG Furnace with Interface |
1 |
|
| GFab003181 |
PhotoLithography |
DNS |
SCW-80A-AVG SOG |
|
1 |
200mm |
| GFab003182 |
PhotoLithography |
DNS |
SCW-80A-AVQ |
|
1 |
200mm |
| GFab003029 |
PhotoLithography |
DNS |
SK-200W |
Photoresist Coater/Developer |
1 |
|
| GFab003054 |
PhotoLithography |
DNS |
SK-200W |
Photoresist Coater/Developer |
1 |
|
| GFab003055 |
PhotoLithography |
DNS |
SKW-80A-BVPE |
Photoresist Coater/Developer, 1
Coat, 2 Develop, WEE for 200mm Wafers |
1 |
|
| GFab003180 |
PhotoLithography |
DNS |
SSW-80A |
|
1 |
200mm |
| GFab003529 |
PhotoLithography |
Eaton
Fusion Division |
200 PC |
UV Bake |
1 |
200 |
| GFab003527 |
PhotoLithography |
Exitech |
157 nm |
Microstepper |
1 |
200 |
| GFab003031 |
PhotoLithography |
FUSION |
M150 |
UV Photoresist Stabilization
Tool |
1 |
|
| GFab003184 |
PhotoLithography |
Fusion Axcelis |
M200 PCU |
|
1 |
200mm |
| GFab003185 |
PhotoLithography |
Fussion Axcelis |
M200 PCU |
|
1 |
200mm |
| GFab003669 |
PhotoLithography |
Horiba |
HORIBAPD3 |
RECTICLE INSPECTION TOOL |
1 |
200 |
| GFab003670 |
PhotoLithography |
KLA-Tencor |
KLA TENCORTERASTAR SLF27 |
RECTICLE INSPECTION TOOL |
1 |
200 |
| GFab003668 |
PhotoLithography |
KLA-Tencor |
KLA-Tencor2401 |
INSPECTION TOOL |
1 |
200 |
| GFab003655 |
PhotoLithography |
Leica |
LEICA INS2000 |
INSPECTION |
1 |
200 |
| GFab003266 |
PhotoLithography |
Leica |
LMS 2020 |
Photomask Image Placement &
Image Size Measuring system. |
1 |
|
| GFab003263 |
PhotoLithography |
Nikon |
NSR-2005i10c |
|
6 |
200mm |
| GFab003199 |
PhotoLithography |
Nikon |
NSR-2205i14E |
Stepper |
1 |
200mm |
| GFab003523 |
PhotoLithography |
TEL |
Act 8 |
Lithograpy
Track |
1 |
200 |
| GFab003124 |
PhotoLithography |
TEL |
Act-12 |
Photoresist Coater/Developer,
Single Block, 2ea Coat, 2ea Develop, WEE, 6ea HP, 7ea CP, 1ea ADH, Call for
More Details |
2 |
|
| GFab003509 |
PhotoLithography |
TOKYO
ELECTRON |
CLEAN TRACK ACT 12 |
|
1 |
|
| GFab003565 |
PhotoLithography |
TOKYO
ELECTRON |
TEL ACT 8 |
TRACK |
1 |
200 |
| GFab003578 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT 8 |
TRACK |
1 |
200 |
| GFab003615 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT 8 |
TRACK |
1 |
200 |
| GFab003645 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT 8 |
TRACK |
1 |
200 |
| GFab003660 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT 8 |
TRACK |
1 |
200 |
| GFab003684 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT 8 |
TRACK |
1 |
200 |
| GFab003692 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT 8 |
TRACK |
1 |
200 |
| GFab003675 |
PhotoLithography |
TOKYO
ELECTRON |
TELACT-8 |
TRACK |
1 |
200 |
| GFab003702 |
PhotoLithography |
TOKYO
ELECTRON |
TELMARK 7 |
TRACK |
1 |
200 |
| GFab003630 |
PhotoLithography |
TOKYO
ELECTRON |
TELMARK 8 |
TRACK |
1 |
200 |
| GFab003638 |
PhotoLithography |
TOKYO
ELECTRON |
TELMARK 8 |
TRACK |
1 |
200 |
| GFab003641 |
PhotoLithography |
 TOKYO
ELECTRON |
TELMARK 8 |
TRACK |
1 |
200 |
| GFab003237 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT-12 |
SOD Coater |
1 |
|
| GFab003215 |
PhotoLithography |
Tokyo Electron (TEL) |
Mark 7 |
|
1 |
200mm |
| GFab003226 |
PhotoLithography |
Tokyo Electron (TEL) |
Mark V |
|
1 |
150mm |
| GFab003241 |
PhotoLithography |
Tokyo Electron (TEL) |
Mark-VIII |
SOG Coater |
1 |
200mm |
| GFab003318 |
PhotoLithography |
ASML |
US INC SERIES 90-S |
|
1 |
200mm |
| GFab003269 |
PhotoLithography |
Axcelis |
200 PCU |
|
1 |
200mm |
| GFab003319 |
PhotoLithography |
Axcelis |
200 PCU |
|
1 |
200mm |
| GFab003321 |
PhotoLithography |
Axcelis |
TECH RAPIDCURE 220CE |
|
1 |
200mm |
| GFab003268 |
PhotoLithography |
BioRad / Accent |
Q7 |
|
1 |
200mm |
| GFab003278 |
PhotoLithography |
BioRad / Accent |
Q7 |
|
1 |
200mm |
| GFab003301 |
PhotoLithography |
BioRad / Accent |
Q8 |
|
1 |
200mm |
| GFab003322 |
PhotoLithography |
Brooks |
BROOKS 3L |
|
1 |
200mm |
| GFab003390 |
PhotoLithography |
Canon |
EX-3 |
Deep UV Wafer Stepper in Wafer Steppers |
1 |
|
| GFab003391 |
PhotoLithography |
Canon |
EX-4 |
Deep UV Wafer Stepper in Wafer Steppers |
1 |
|
| GFab003283 |
PhotoLithography |
Hitachi |
HI TECH 6780 |
|
1 |
200mm |
| GFab003327 |
PhotoLithography |
Hitachi |
HI TECH 6780 |
|
1 |
200mm |
| GFab003329 |
PhotoLithography |
Hitachi |
HI TECH S8840 |
|
1 |
200mm |
| GFab003270 |
PhotoLithography |
Hitachi |
HI TECH S9300 |
|
1 |
200mm |
| GFab003330 |
PhotoLithography |
Hitachi |
HI TECH S9300 |
|
1 |
200mm |
| GFab003289 |
PhotoLithography |
Nikon |
NRS S202+ |
|
1 |
200mm |
| GFab003290 |
PhotoLithography |
Nikon |
NRS S202+ |
|
1 |
200mm |
| GFab003366 |
PhotoLithography |
Nikon |
NRS S202+ |
|
1 |
200mm |
| GFab003367 |
PhotoLithography |
Nikon |
NRS S204 |
|
1 |
200mm |
| GFab003273 |
PhotoLithography |
Nikon |
NRS S306 |
|
1 |
200mm |
| GFab003291 |
PhotoLithography |
Nikon |
NRS S306 |
|
1 |
200mm |
| GFab003292 |
PhotoLithography |
Nikon |
NRS S306 |
|
1 |
200mm |
| GFab003272 |
PhotoLithography |
Nikon |
NSR 4425I |
|
1 |
200mm |
| GFab003361 |
PhotoLithography |
Nikon |
NSR2005-i11 |
|
1 |
200mm |
| GFab003362 |
PhotoLithography |
Nikon |
NSR2005-i11 |
|
1 |
200mm |
| GFab003363 |
PhotoLithography |
Nikon |
NSR2005-i11 |
|
1 |
200mm |
| GFab003364 |
PhotoLithography |
Nikon |
NSR2005-i12 |
|
1 |
200mm |
| GFab003365 |
PhotoLithography |
Nikon |
NSR2005-i9 |
|
1 |
200mm |
| GFab003393 |
PhotoLithography |
Nikon |
NRS-S2O2A |
|
1 |
|
| GFab003394 |
PhotoLithography |
Nikon |
NSR S203B |
Lithography Equipment
- Other in Lithography |
1 |
|
| GFab003392 |
PhotoLithography |
Nikon |
NSR2005i8A |
I-Line Wafer Stepper in Wafer Steppers |
1 |
|
| GFab003297 |
PhotoLithography |
Semitool |
WST 308 |
|
1 |
200mm |
| GFab003381 |
PhotoLithography |
Thermawave |
2600B |
|
1 |
200mm |
| GFab003274 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 12-200 |
|
1 |
200mm |
| GFab003298 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 12-200 |
|
1 |
200mm |
| GFab003275 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 8 |
|
1 |
200mm |
| GFab003276 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 8 |
|
1 |
200mm |
| GFab003375 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 8 |
|
1 |
200mm |
| GFab003376 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 8 |
|
1 |
200mm |
| GFab003377 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT 8 |
|
1 |
200mm |
| GFab003277 |
PhotoLithography |
Tokyo Electron (TEL) |
ACT12 |
|
1 |
200mm |
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