| GFAB Ref |
Category |
OEM |
Model |
Tool/Description |
| GFab001429 |
Photo |
Accent |
Q7 |
|
| GFab001019 |
Metrology |
ADE |
6034 |
Wafer Measurement |
| GFab001636 |
Test |
ADE |
9350 |
Wafer Test System, 200mm Wafers |
| GFab001637 |
Test |
ADE |
3046A |
Wafer Thickness, Taper & Bow Tester |
| GFab001608 |
Test |
ADE |
7900 Ultra Gage |
Multifunction Dimensional Measurements for 500nm design rule |
| GFab001638 |
Test |
ADE |
8100-14 |
Wafer Tester with Wafer Shape, High Resistivity and Type
Testing |
| GFab001531 |
Test |
ADE |
ADE 9700 |
|
| GFab001020 |
Metrology |
ADE |
EpiScan 1000 |
High-speed film thickness measurement and mapping tool |
| GFab001021 |
Metrology |
ADE |
Ultra Gage 9500 |
|
| GFab001886 |
Test |
ADE 9500 Ultragage |
Ultragage 9500 |
|
| GFab001372 |
Metrology |
ADEC |
ADE 9500 |
|
| GFab001272 |
Test |
ADEC |
BT1152-240 |
ADEC 1152 Board Tester |
| GFab001210 |
Metrology |
ADE-DMS |
780 MRT |
Digital Measurement System |
| GFab001442 |
Test |
Advantest |
M6761A |
Retho Test ATE |
| GFab001447 |
Test |
Advantest |
M6761AD |
Retho Test ATE |
| GFab002000 |
Test |
Advantest |
T3324 |
Memory Tester |
| GFab002001 |
Test |
Advantest |
T5363P |
Memory Tester |
| GFab002002 |
Test |
Advantest |
T5363P |
Memory Tester |
| GFab001443 |
Test |
Advantest |
T5365P |
Memory Test in Device |
| GFab001444 |
Test |
Advantest |
T5365P |
Memory Test in Device |
| GFab001445 |
Test |
Advantest |
T5365P |
Memory Test in Device |
| GFab001486 |
Assembly |
Advantest |
T5382A |
Memory Tester (Dual head with MRAA) |
| GFab001487 |
Assembly |
Advantest |
T5382A |
Memory Tester (Single head#1) |
| GFab001884 |
Test |
Advantest |
T666AF |
ESD Tester |
| GFab001446 |
Test |
Advantest |
T6673 |
Digital Test Systems in Device |
| GFab001382 |
Assembly |
Advantest |
TR1000T |
|
| GFab001488 |
Assembly |
Advantest |
T5382A |
Memory Tester (Single head#2) |
| GFab001485 |
Assembly |
Advantest |
T5382A |
Memory Tester (Dual head) |
| GFab001489 |
Assembly |
Advantest |
T5581P |
Memory Tester (Single head) |
| GFab001448 |
Test |
Aehr |
MTX 3000 H/A |
|
| GFab001641 |
Test |
AERONCA |
WIS-100 |
Wafer Surface Inspection System |
| GFab001642 |
Test |
AERONCA |
WIS-900 |
Wafer Surface Inspection System, 2ea Available |
| GFab001643 |
CVD |
AG ASSOCIATES |
2106 |
Rapid Thermal Processing System, for 100mm-150mm Wafers |
| GFab001644 |
CVD |
AG ASSOCIATES |
2146 |
Rapid Thermal Processing System, Parts Tool Only |
| GFab001023 |
CVD |
AG Associates |
610 Heatpulse |
RTA Rapid Thermal Annealing |
| GFab001022 |
CVD |
AG Associates |
4100 Heatpulse |
RTA Rapid Thermal Annealing |
| GFab001025 |
CVD |
AG Associates |
Heatpulse 410 |
RTA Rapid Thermal Annealing |
| GFab001982 |
Test |
AGIDENT |
16442A |
Parameter Analyzer Tool |
| GFab001404 |
Test |
Agilent |
1100 |
|
| GFab001312 |
Other |
Agilent Technologies |
V4400 |
|
| GFab001313 |
Other |
Agilent Technologies |
V4400 |
|
| GFab001273 |
Subsystem |
Air Liquide |
See Listing |
Gas VMBs |
| GFab001449 |
Test |
Aixacct |
TF Analyzer 2000 |
| GFab001581 |
CVD |
Aixtron |
AIX200 |
LP-MOCVD Chemical Vapor Deposition |
| GFab001645 |
Wet |
AKRION |
V2-HL.2000 |
Hybrid-Linear Automatic Acid Wet Station with Robotic Transfer
(New), for Dual 150mm Cassettes |
| GFab001646 |
Wet |
AKRION |
V2-SA.3200 |
Semi-Automatic Acid Wet Station w/Robotic Transfer, 7 Tanks
for Dual 150mm Cassettes |
| GFab001647 |
Wet |
AKRION |
V2-SA.3200 |
Semi-Automatic S/S Solvent Wet Station (New) |
| GFab001568 |
PVD |
Alcatel |
2441C |
RF Sputter UP system |
| GFab001648 |
Test |
ALESSI |
REL-4500 |
Analytical Manual Wafer Prober - Parts Tool Only |
| GFab001490 |
Assembly |
Alpha Innotech |
FA-1000 |
Photo Emission Microscopy System |
| GFab001472 |
Assembly |
Alphasem |
SL9002-MM |
Flip Chip bonder |
| GFab001649 |
Test |
ALPHASEM |
Swissline 9006 |
Automatic Epoxy Die Bonder, 2ea Available |
| GFab002009 |
Others |
AMAT |
8" Susceptor |
Calibration Leveling tool |
| GFab001507 |
Etch |
AMAT |
AME8330 |
|
| GFab001516 |
Etch |
AMAT |
AME8330 |
|
| GFab001547 |
CVD |
AMAT |
Centura 5200 CVD |
1999, SACVD |
| GFab001528 |
CVD |
AMAT |
Centura 5200 RTP |
200mm |
| GFab001529 |
CVD |
AMAT |
Centura 5200 RTP |
200mm |
| GFab001537 |
CVD |
AMAT |
Centura 5200 RTP |
2000, 200mm |
| GFab001523 |
CVD |
AMAT |
Centura 5300 |
200mm |
| GFab001510 |
Etch |
AMAT |
Centura DPS+ |
1999, 200mm |
| GFab001931 |
Etch |
AMAT |
Centura eMAX |
Oxide Etch |
| GFab001520 |
Etch |
AMAT |
CENTURA II DPS+ |
2002, 200mm |
| GFab001545 |
Etch |
AMAT |
Centura II Super E |
2000, Oxide Etch |
| GFab001546 |
Etch |
AMAT |
Centura II Super E |
2000, Oxide Etch |
| GFab001920 |
Etch |
AMAT |
Centura MXP |
Poly Etch |
| GFab001525 |
Etch |
AMAT |
E-Max Chamber Assy |
200mm |
| GFab001525A |
Etch |
AMAT |
E-Max Chamber Assy |
200mm |
| GFab001526 |
Etch |
AMAT |
E-Max Chamber Assy |
200mm |
| GFab002011 |
Etch |
AMAT |
P5000 |
MxP+ Etch |
| GFab002012 |
Etch |
AMAT |
P5000 |
TEOS |
| GFab001919 |
Etch |
AMAT |
P-5000 |
Poly Etch |
| GFab001953 |
CVD |
AMAT |
P-5000 |
TiN CVD |
| GFab001954 |
CVD |
AMAT |
P-5000 |
CVD |
| GFab001511 |
Etch |
AMAT |
P-5000 |
1995.10, 200mm |
| GFab001519 |
Etch |
AMAT |
P-5000 |
1994, 200mm |
| GFab001521 |
Etch |
AMAT |
P5000 ETCH |
200mm |
| GFab001522 |
Etch |
AMAT |
P5000 ETCH |
200mm |
| GFab001524 |
Etch |
AMAT |
P5000 ETCH |
200mm |
| GFab001952 |
CVD |
AMAT |
P5000 MK-II |
TEOS CVD |
| GFab001951 |
CVD |
AMAT |
P5000C |
SIN CVD |
| GFab001955 |
CVD |
AMAT |
P5000Wxz |
W-CVD |
| GFab001927 |
Etch |
AMAT |
PE8330 |
METAL Etch |
| GFab001928 |
Etch |
AMAT |
PE8330 |
METAL Etch |
| GFab001929 |
Etch |
AMAT |
PE8330 |
METAL Etch |
| GFab001937 |
Implant |
AMAT |
PI9500 |
High Current Implanter |
| GFab001938 |
Implant |
AMAT |
PI9500 |
High Current Implanter |
| GFab001939 |
Implant |
AMAT |
PI9500 |
High Current Implanter |
| GFab001026 |
Metrology |
AMEL Instruments |
Instruments Model 2049 |
| GFab001027 |
Metrology |
AMEL Instruments |
Instruments Model 2053 |
| GFab001274 |
Test |
Amtech/Tempress |
|
Amtech/Tempress Atmoscan System (New in crate) |
| GFab001028 |
PVD |
Anatech Hummer |
6.2 |
|
| GFab001961 |
PVD |
Anelva |
I-1060 SVII Plus-1 |
Co-Sputter |
| GFab001962 |
PVD |
Anelva |
I-1060SV II |
Alminium Sputter |
| GFab001959 |
PVD |
Anelva |
ILC-1060SV |
Sputter |
| GFab000951 |
CVD |
APEX |
F636A-01 (Cruise 2000) |
MOCVD LCSVD |
| GFab001899 |
Test |
Applied Material Orbot
WF736 $65K |
Tester |
| GFab000944 |
Etch |
Applied Materials |
5300 |
Etcher |
| GFab001650 |
Etch |
APPLIED MATERIALS |
8330 |
Hexode Plasma Etchers for 125mm Wafers |
| GFab001628 |
Etch |
Applied Materials |
8330 |
Metal Etcher |
| GFab000908 |
Implant |
Applied Materials |
9200 |
|
| GFab000909 |
Implant |
Applied Materials |
9500 |
|
| GFab001438 |
CVD |
Applied Materials |
5200 Centura |
|
| GFab001450 |
Etch |
Applied Materials |
8300A-0020 |
Oxide Etcher |
| GFab001426 |
CVD |
Applied Materials |
AMAT 5200 CENTURA |
| GFab001417 |
CVD |
Applied Materials |
AMAT P5000 |
CVD |
| GFab001425 |
CVD |
Applied Materials |
AMAT P5000 |
|
| GFab001365 |
Thin Films |
Applied Materials |
AMAT ULTIMA X 300MM |
HDPCVD |
| GFab001314 |
Thin Films |
Applied Materials |
Centura 5200 DPN |
| GFab001315 |
Thin Films |
Applied Materials |
Centura 5200 DPN |
| GFab001316 |
Thin Films |
Applied Materials |
Centura 5200 Metal Etch
MxP |
| GFab000852 |
Etch |
Applied Materials |
Centura 5200 Oxide Etch
MxP+ |
| GFab000910 |
CVD |
Applied Materials |
Centura RTP XE+/Wsix |
| GFab001317 |
Thin Films |
Applied Materials |
Centura SACVD |
|
| GFab001439 |
Other |
Applied Materials |
Compass |
|
| GFab001651 |
Test |
APPLIED MATERIALS |
DR SemVision |
SEM Based Defect Review System |
| GFab001607 |
Test |
Applied Materials |
Excite |
High Speed Particle Detection |
| GFab001451 |
Test |
Applied Materials |
Excite IPM |
Unpatterned Wafer Inspection |
| GFab001582 |
CVD |
Applied Materials |
HDPEtch Chamber |
| GFab001318 |
Other |
Applied Materials |
IPM 832 |
|
| GFab001411 |
CVD |
Applied Materials |
P5000 |
CVD |
| GFab001319 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001320 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001321 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001322 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001323 |
CVD |
Applied Materials |
Reflexion - ILD |
|
| GFab001652 |
CVD |
APPLIED MATERIALS |
Type 3 |
On Board TEOS Hot Box, 6 Channels |
| GFab001202 |
CVD |
Applied Materials |
5000 |
3 Ch SACVD System, refurbished |
| GFab001203 |
CVD |
Applied Materials |
5000 |
3 Ch Silane PECVD system, refurbished |
| GFab001204 |
Etch |
Applied Materials |
Centura 5200 |
2 Ch DPS R1 poly etch system, refurbished |
| GFab001205 |
Etch |
Applied Materials |
Centura 5200 |
3 Ch eMxP+ oxide etch system, refurbished |
| GFab001206 |
CVD |
Applied Materials |
Centura 5200 |
4 Ch DXZ PECVD System, refurbished |
| GFab001207 |
CVD |
Applied Materials |
Centura 5200 |
4 Ch DXZ SACVD System, refurbished |
| GFab001208 |
ALD |
Applied Materials |
Centura 5200 |
Ald Centura System |
| GFab001211 |
CVD |
Applied Materials |
Centura 5200 |
MxP Etch system - Oxide 200mm |
| GFab001213 |
Metrology |
Applied Materials |
Opal 7830i |
CD SEM |
| GFab001212 |
Metrology |
Applied Materials |
SEM VISION CX |
SEM |
| GFab001653 |
Etch |
APT |
3145 |
Metal Etch Tools with Robotic Handling, for 75mm to 200mm
Wafers, 2ea Available |
| GFab001275 |
Subsystem |
Arch |
Genstream |
Arch Teos Delivery System (New) |
| GFab001452 |
Diffusion |
ASM |
Polygon Platform |
Thin Film |
| GFab001654 |
Photo |
ASML |
2500/40 |
i-Line Wafer Stepper |
| Gfab002010 |
Photo |
ASML |
PAS 5000 / 45 |
STEPPER |
| GFab001432 |
Photo |
ASML/SVG US INC |
MSII+ |
Track |
| GFab001430 |
Photo |
ASML/SVG US INC |
SERIES 90-S |
Track |
| GFab001431 |
Photo |
ASML/SVG US INC |
SERIES 90-S |
Track |
| GFab001622 |
Other |
Asyst |
SMIF 300 WMS |
Wafer Management system |
| GFab001029 |
Wet |
Atcor |
CRD-2410 |
Box Washer |
| GFab001383 |
Assembly |
Avsi |
AVSI 480BT |
|
| GFab001398 |
Photo |
Axcelis |
200 PCU |
|
| GFab001214 |
Photo |
Axcelis |
200PCU |
Photostabilizer |
| GFab001215 |
Photo |
Axcelis |
AC2 |
Ozone Asher |
| GFab001441 |
Implant |
Axcelis |
HC3 Ultra 5.5 |
Ion Implanter- 300mm-13 wafer batch- 4 PDOs- full 300mm
factory automation-exc condition |
| GFab000937 |
Photo |
Axcelis / Fusion |
200 ACU |
Ashing System |
| GFab000938 |
Photo |
Axcelis / Fusion |
M 200 PC |
UV Cure System |
| GFab001549 |
PVD |
Balzers |
BAK 760 |
High Capacity High Vacuum Evaporation System |
| GFab001030 |
Subsystem |
Bay Voltex HS 0550-AC-SX-ENL |
HS 0550-AC-SX-ENL |
| GFab001031 |
Subsystem |
Bay Voltex LT-1650-WC-DI-AM Chiller |
LT-1650-WC-DI-AM Chiller |
| GFab001621 |
Assembly |
Benchmark Gen II |
SM-8000 |
Parallel Seam Sealer |
| GFab001532 |
Test |
Biorad |
Bio-RAD |
Overlay and CD Measurement System |
| GFab001533 |
Test |
Biorad |
Bio-RAD |
Overlay and CD Measurement System |
| GFab001655 |
Test |
BIORAD |
Q6 |
Overlay Metrology Tool |
| GFab001656 |
Test |
BIORAD |
Q7/Q8 |
Overlay Metrology Tool for up to 200mm Wafers, 3ea Available |
| GFab001657 |
Test |
BIORAD |
QS-300 |
FTIR Epi Thickness Monitor for up to 150mm Wafers |
| GFab001658 |
Test |
BIORAD |
QS-300 |
FTIR Epi Thickness Monitor for up to 200mm Wafers |
| GFab001659 |
Test |
BIORAD |
QS-500 |
FTIR Epi Thickness Monitor for up to 200mm Wafers |
| GFab001384 |
Assembly |
Blue M |
DCC-256F |
Oven |
| GFab001276 |
Other |
Blue M |
IGF-6680F-4 |
Blue M Ultra Temp Oven |
| GFab001032 |
Subsystem |
Blue M |
DCC 256C |
Cleanroom Oven |
| GFab001033 |
Subsystem |
Blue M |
Model CW-190G-MP2 |
High Temp Oven |
| GFab001034 |
Subsystem |
Blue M |
Model DCC-146C |
| GFab001277 |
Subsystem |
Bold |
PT1180, PT1184 |
Bold Recirculators |
| GFab001035 |
Etch |
Branson |
IPC 4000 |
Barrel Asher |
|
|
|
|
|
| GFab001434 |
CMP |
Brooks |
8100 |
|
| GFab001278 |
Spares |
Brooks |
various |
Brooks Mass Flow Controllers |
| GFab001037 |
Subsystem |
Buehler |
Budzar Ice Chiller |
Chiller |
| GFab001219 |
Photo |
Cannon |
FPA-3000-i4 |
Wafer Stepper |
| GFab001220 |
Photo |
Cannon |
FPA-3000-i4 |
Wafer Stepper |
| GFab001221 |
Photo |
Cannon |
FPA-3000-i4 |
Wafer Stepper |
| GFab001218 |
Photo |
Cannon |
FPA-3000-i5 |
Wafer Stepper |
| GFab001216 |
Photo |
Cannon |
FPA-3000-iW |
Wafer Stepper |
| GFab001217 |
Photo |
Cannon |
FPA-3000-iW |
Wafer Stepper |
| GFab001814 |
Photo |
Canon |
1550 |
Mark V steppers, G line |
| GFab001512 |
Photo |
Canon |
Aligner(PLA-501FA) |
| GFab001957 |
CVD |
CANON |
APT5850 |
TEOS-3 CVD |
| GFab000933 |
Photo |
Canon |
FPA 1550 |
g line stepper |
| GFab000932 |
Photo |
Canon |
FPA1550M3W |
g line stepper |
| GFab001922 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001923 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001924 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001925 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001926 |
Etch |
CANON |
MAS-8000 |
Asher |
| GFab001933 |
Etch |
CANON |
MAS-801 |
Asher |
| GFab001038 |
Photo |
Canon |
MPA 500 |
Projection Mask Aligner |
| GFab001039 |
Photo |
Canon |
PLA 501F |
Parallel Light Mask Aligner Cassette to cassette Mask aligner
for 2"-5" wafer |
| GFab001909 |
Photo |
CANON |
PLA501FA |
Mask Aligner |
| GFab001040 |
Photo |
Canon |
PLA 501F |
Parallel Light Mask Aligner Cassette to cassette Mask aligner
for 2"-6" wafer |
| GFab001459 |
Metrology |
Carl Zeiss |
MSM100 / AIMS |
| GFab001660 |
Test |
CDE |
ResMap 378 |
Resistivity Mapping Tool, for up to 300mm Wafers |
| GFab000838 |
Test |
CDE |
ResMap168 |
Automated four point probe for resistivity and metal thickness
mapping |
| GFab001557 |
PVD |
CHA |
MPS 4 |
Multiposition Horizontal Sputtering system |
| GFab001558 |
PVD |
CHA |
SSB 600 |
Single Target DC Magnetron Sputting system |
| GFab001892 |
Test |
Chapman |
MP 2000 Plus |
Laser Profiler |
| GFab001661 |
Test |
CR TECHNOLOGY |
CRX-1000 |
Real Time Xray Imaging System |
| GFab001332 |
Test |
Creative Design Engineering (CDE) |
ResMap 463 |
|
| GFab001331 |
Test |
Creative Design Engineering
(CDE) |
ResMap 463 |
|
| GFab001633 |
Assembly |
Credence |
212 |
Parts Machine Only |
| GFab001367 |
Metrology |
Credence |
IDS2000 |
Tester |
| GFab001460 |
Test |
Credence |
Kalos PK1 |
Automated Test Prober for Flash Memory |
| GFab001635 |
Test |
Credence |
Personal Kalos |
|
| GFab001041 |
PVD |
CVC |
611 |
Loadlock Deposition System Sputter Capability up to 6" |
| GFab001995 |
Test |
Daito Shoji |
F-3555 |
RETICLE INSPECTION |
| GFab000839 |
Test |
Dektak |
3 Series |
Surface profilometer and step height measurement |
| GFab001279 |
Other |
Delatech |
858-4 |
Delatech CDO System |
| GFab001389 |
Assembly |
Delta Design |
1020 FLEX HNDLR |
Handler |
| GFab001390 |
Assembly |
Delta Design |
1020 FLEX HNDLR |
Handler |
| GFab001391 |
Assembly |
Delta Design |
1210 FLEX HNDLR |
Handler |
| GFab001662 |
Test |
DELTRONIC |
DV-114 |
Optical Comparator with Digital XY Readout |
| GFab001392 |
Assembly |
Despatch |
CRB |
|
| GFab002008 |
Assembly |
DISCO |
DFD620 |
Dicing Saw |
| GFab001800 |
CVD |
DJ-807 |
Kokusai |
4 Chamber Furnace w/ preclean |
| GFab001812 |
Photo |
DNS |
626 |
Coater, Developer |
| GFab001541 |
Photo |
DNS |
DNS-629 |
PR Coater |
| GFab001542 |
Photo |
DNS |
DNS-629 |
PR Coater |
| GFab001543 |
Photo |
DNS |
DNS-629 |
PR Coater |
| GFab001945 |
Wet |
DNS |
FC-821L |
1 BATH RCA SCRUBBER |
| GFab001333 |
Wet |
DNS |
FC-821L |
|
| GFab001334 |
Wet |
DNS |
FC-821L |
|
| GFab001905 |
Photo |
DNS |
SC-W60A-AVFG |
SOG Coater |
| GFab001910 |
Photo |
DNS |
SCW-80A-AV(Q) |
POLYMID COATER |
| GFab001663 |
Wet |
DNS |
SC-W80A-AVFG |
SOG Furnace with Interface |
| GFab001904 |
Photo |
DNS |
SC-W80A-AVG |
SOG Coater |
| GFab001223 |
Photo |
DNS |
SK200W-RVPE |
Track System |
| GFab001667 |
Wet |
DNS |
SK-W80A-BVP |
Photoresist Coater/Developer, 3 Coat, 2 Develop, 200mm Wafers |
| GFab001222 |
Photo |
DNS |
SK-W80A-BVP |
Track System |
| GFab001668 |
Wet |
DNS |
SKW-80A-BVPE |
Photoresist Coater/Developer, 1 Coat, 2 Develop, WEE for 200mm
Wafers |
| GFab001944 |
Wet |
DNS |
SR-3000 |
Cleaner |
| GFab000853 |
Wet Etch |
DNS |
SS-W80AAR |
|
| GFab001998 |
Test |
DNS |
VM-8200 |
Thickness Measurement |
| GFab001335 |
Wet |
DNS |
VPC |
|
| GFab001669 |
Wet |
DNS |
WS-820C |
Automated Wet Processing System with IPA Vapor Dryer, 200mm Wafers |
| GFab001850 |
Photo |
DNS |
629 |
PR coater |
| GFab001464 |
Photo |
DNS- Dainipponscreen |
DP-636-C |
3 Tracks with each 3 hotplate and 1 coolplate. Each track has
1 carrier send and 1 receive. |
| GFab001894 |
Photo |
DNS |
W80 |
SOG Coater |
| GFab001465 |
Photo |
DNS-Dainipponscreen |
DP-636-C |
1 Coater unit 4 Hotplates 2 Coolplates 4 Carriers 2 coating
systems with pressuredispence from the tank/bottle each is suported with a
traptank. Suitable for any Type of Photoresist. |
| GFab001405 |
Other |
Dryden |
DE3496SPD |
|
| GFab001280 |
Etch |
Drytek |
Megastrip 6 |
Drytek Megastrip 6 |
| GFab001872 |
Test |
Duo |
Credence |
VLSI, Tester 50/100 Mhz Conf. 60Mhz 1digital capture board W/8
pins, 2 abbitary waveform Generator boards for 16 pins AWG. |
| GFab001042 |
Test |
Dupont |
120ssa |
Helium Leak Detector |
| GFab001670 |
Assembly |
DUSAN |
Smart Die |
Trim & Form Press, 5ea Available |
| GFab001671 |
Assembly |
DYNATEX |
DX-III |
Wafer Scriber/Breaker |
| GFab001043 |
Test |
E G & G Instruments |
Model 263A |
|
| GFab001672 |
Test |
EALING INSTRUMENTS |
6' Long |
Optical Bench |
| GFab000983 |
Implant |
Eaton |
H143 (NV-10-80) |
Implant |
| GFab001282 |
Subsystem |
Ebara |
2.1 |
Ebara 2.1 Cryo Compressors |
| GFab001283 |
Subsystem |
Ebara |
4.8 |
Ebara 4.8 Cryo Compressors |
| GFab000831 |
CMP |
Ebara |
EPO |
Ebara Integrated Polish Configurations |
| GFab001467 |
Test |
Edax |
CM200ST Alpha 147-5 |
Failure Analysis |
| GFab001468 |
Test |
Edax |
EDX |
Failure Analysis |
| GFab001369 |
Diffusion |
EEJA |
POSFER |
|
| GFab001631 |
Test |
Electroglas |
4085cx |
Prober with hot chuck |
| GFab001224 |
Metrology |
Electroglas |
4090u |
Prober |
| GFab001878 |
Test |
Electroglas |
5/300e |
Prober, 300mm, hot/cold nickel chuck, -55degC-+200degC, Auto
probe to pad, chiller, manip. |
| GFab001373 |
Test |
Electroglas |
EG 4085 |
Prober |
| GFab001371 |
Test |
Electroglas |
EG 4085X |
Prober |
| GFab001469 |
Test |
Electroglas |
Horizon 4085X |
Automatic Wafer Prober |
| GFab001044 |
Power
Supplies-RF-Plasma-E-Gun |
Electrotech |
LF-24 |
|
| GFab001860 |
Test |
EM-1 |
Prometrix |
|
| GFab001045 |
Subsystem |
ENI |
ACG-10 |
Generator |
| GFab001046 |
Subsystem |
ENI |
HF-1 |
Generator |
| GFab001869 |
Test |
EPRO |
142AX |
Memory Tester |
| GFab001816 |
Test |
Ergolux |
Ergolux |
Microscope |
| GFab001673 |
Assembly |
ESEC |
2005 LOC |
Automatic Die Bonder |
| GFab001281 |
Assembly |
ESEC |
3006F/X |
ESEC 30006F/X Wire Bonder |
| GFab001336 |
Repair |
ESI |
9800 |
|
| GFab001337 |
Repair |
ESI |
9800 |
|
| GFab001338 |
Repair |
ESI |
9800 |
|
| GFab001339 |
Repair |
ESI |
9800 |
|
| GFab001614 |
Other |
ESI |
9250A |
Laser Semiconductor Processing System, 1996 |
| GFab001613 |
Other |
ESI |
9250B |
Laser Semiconductor Processing System, 1996 |
| GFab001491 |
Assembly |
ESI |
8000/200 |
Laser Processing System |
| GFab001470 |
Repair |
ESI Inc |
9820 |
Laser Repair |
| GFab001340 |
Repair |
Estek |
WIS-800 |
|
| GFab001047 |
Metrology-Test Systems |
Estek Wis |
600 |
Inspection System Wafer Surface Analysis System Capability
3" to 6" wafers. |
| GFab001385 |
Test |
ETS Lindgren |
5407 |
|
| GFab001399 |
Assembly |
Evertech |
UNKNOWN |
|
| GFab001471 |
Assembly |
EVG |
540 G2W |
Die Bonder |
| GFab001393 |
Metrology |
Fein Focus |
F3D-160-10(V) |
Xray |
| GFab001473 |
Assembly |
FICO |
TFM-1A |
Lead Forming Tool |
| GFab001837 |
Test |
FLX2320 |
KLA-TENCOR |
|
| GFab001284 |
Subsystem |
Fortrend |
See Listing |
Fortrend Wafer Transfers |
| GFab001048 |
Metrology-Test Systems |
Four Dimension Movec |
280TC |
Automated 4 Point Probe Capable of 100mm to 200mm wafers |
| GFab001675 |
Wet |
FSI |
8221 |
Spin Rinse Dryer |
| GFab000984 |
Wet |
FSI |
Excalibre |
Vapor Cleaner |
| GFab000985 |
Wet |
FSI |
Excalibre |
Vapor Cleaner |
| GFab001049 |
Photoresist Coaters-Tracks |
FSI Polaris |
1000 |
Microlithography Cluster tool (Coat / Dev) Capability 3"
to 6" wafers |
| GFab001050 |
Photo |
Fusion |
150 PC |
UV systems |
| GFab000850 |
Photo |
Fusion |
150PC-200PCU- Gemini |
Photostablilizers and EPROM erasers (dual application) |
| GFab001225 |
Photo |
Fusion |
200PC |
Photostabilizer |
| GFab001535 |
Photo |
Fusion |
Asher |
|
| GFab001536 |
Photo |
Fusion |
Asher |
|
| GFab001227 |
Photo |
Fusion |
G03 |
Photostabilizer |
| GFab001228 |
Photo |
Fusion |
G03 |
Photostabilizer |
| GFab000854 |
Photo |
Fusion |
M200 PCU |
|
| GFab001454 |
Photo |
Fusion Systems |
PS3 UV Harden |
Photoresist Curing |
| GFab001455 |
Photo |
Fusion Systems |
PS3 UV Harden |
Photoresist Curing |
| GFab001676 |
Test |
GAERTNER |
Stokes LSE |
Ellipsometer, Manual 300MM max |
|
|
|
|
|
|
|
|
|
|
| GFab001053 |
Photo |
Gasonics |
Aura 1000 |
Photoresist Asher 75mm to 150mm wafer capability |
| GFab001054 |
Photo |
Gasonics |
Aura 2000LL |
Loadlock
Asher Configured for 4"- 8" Wafers |
| GFab001055 |
Photo |
Gasonics |
Aura 2000LL |
Loadlock Asher Configured for 4"- 8" Wafers |
| GFab001056 |
Photo |
Gasonics |
L3510 |
Single Wafer Ashing System Substrate Size: 3-8inch /
75mm-200mm |
| GFab001677 |
Test |
GCA/TROPEL |
9000 |
Surface Flatness Analyzer |
| GFab001407 |
Assembly |
GD-Takatori |
1100 |
Gold- Grind |
| GFab001406 |
Assembly |
GD-Takatori |
2100 |
Gold- Grind |
| GFab001583 |
CVD |
Gemini |
Gemini 3 |
Dual Chamber Epitaxial Reactor |
| GFab001285 |
CVD |
Gemini |
Gemini II |
Gemini II EPI Reator (Left Side Controller) |
| GFab001286 |
CVD |
Gemini |
Gemini II |
Gemini II EPI Reator (Right Side Controller |
| GFab001492 |
Assembly |
Genesis |
Tester II |
Tester II |
| GFab001493 |
Assembly |
Genesis |
Tester II |
Tester II |
| GFab001478 |
Assembly |
Geringer |
|
|
| GFab001612 |
Other |
GSI Lumonics |
HM1400L |
Laser Marking system |
| GFab001057 |
Test |
Hach One Laboratory |
Hach One Laboratory
PH/Meter |
| GFab001811 |
CVD |
Hipox |
Gasonics |
w/Haskel Pumps, up to 125mm |
| GFab001386 |
Defect Metrology |
Hirayama |
PC305S III |
|
| GFab001387 |
Defect Metrology |
Hirayama |
PC305S III |
|
| GFab001678 |
Test |
HITACHI |
4500 |
| Analytical
Scanning Electron Microscope |
|
| GFab001810 |
Etch |
Hitachi |
308 ATE |
Poly Etcher |
| GFab001831 |
Test |
Hitachi |
7280H |
|
| GFab001416 |
Etch |
Hitachi |
HI TECH 308 |
Etcher |
| GFab001424 |
Etch |
Hitachi |
HI TECH 308 |
Etcher |
| GFab001419 |
Photo |
Hitachi |
HI TECH 8820 |
|
| GFab001994 |
Test |
HITACHI |
IRG-10-T10 |
REVIEWER |
| GFab001003 |
Metrology |
Hitachi |
IS-2000 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001993 |
Test |
HITACHI |
IS2500 |
WAFER INSPECTION |
| GFab002005 |
Test |
HITACHI |
LS-6030K |
Particle Inspection |
| GFab001983 |
Test |
HITACHI |
S-4160 |
FE-SEM |
| GFab001341 |
Etch |
Hitachi |
S-4500 |
|
| GFab000992 |
Metrology |
Hitachi |
S-6000 |
CD SEM |
| GFab000993 |
Metrology |
Hitachi |
S-6000 |
CD SEM |
| GFab001679 |
Test |
HITACHI |
S-6000 |
Field Emission CDSEM, 2ea Available |
| GFab000995 |
Metrology |
Hitachi |
S-7000 |
CD SEM |
| GFab001680 |
Test |
HITACHI |
S-7000 |
CD SEM Measurement Tool, 2ea Available |
| GFab001479 |
Test |
Hitachi |
S-7800 |
CD SEM |
| GFab001984 |
Test |
HITACHI |
S-8820 |
CD-SEM |
| GFab001527 |
Test |
HITACHI |
S-8820 |
200mm |
| GFab001990 |
Test |
HITACHI |
S-9260 |
SEM |
| GFab001992 |
Test |
HITACHI |
S-9260 |
SEM |
| GFab001515 |
Test |
HITACHI |
SEM S7000 |
|
| GFab001505 |
Test |
HITACHI |
SEM S7800 |
|
| GFab001889 |
Test |
Hitachi |
8820 |
CD Sem |
| GFab001342 |
Other |
Holon |
EMU220 |
|
| GFab001616 |
Test |
Hypervision |
Visionary 2000 |
Emission Microscope |
| GFab001921 |
Etch |
ICF |
|
EKC Wet station |
| GFab001942 |
Wet |
ICF |
|
Tube Cleaner for Vertical furnace |
| GFab001875 |
Etch |
ICP Multiplex |
STS |
Inductively coupled plasma, GaN Bluechip, vintage 2002 |
| GFab001495 |
Assembly |
IMS Tester |
ATS 1271 |
Tester- spare system |
| GFab001494 |
Assembly |
IMS Tester |
ATS 1271 |
Tester-full system |
| GFab000996 |
Metrology |
Inficon |
TRS-H200M |
GAS ANALYZER |
| GFab001480 |
Repair |
Innolas |
IL C 3000 DPS |
Laser YAG |
| GFab001559 |
PVD |
Innotec |
VS 24C |
5 Target DC Sputtering System |
| GFab001861 |
PVD |
Inova |
Novellus |
PVD 200mm |
| GFab001007 |
Metrology |
Inspex |
TPC8500 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001004 |
Metrology |
Inspex |
TPC8520 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001005 |
Metrology |
Inspex |
TPC8525 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001006 |
Metrology |
Inspex |
TPC8525M |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001008 |
Metrology |
Inspex |
TPC8530 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001481 |
Test |
Integrated Dynamics Eng |
TC |
Shock Vibration |
| GFab001059 |
Ion Implantors |
Ion Tech Inc |
Sourcerer |
Ion Beam
System Dual Ion Beam Deposition |
| GFab001681 |
Test |
IONIC |
Stressgage |
Wafer Film Stress Tester, 2ea Available |
| GFab000832 |
CMP |
IPEC |
472 / 372M |
Rotational CMP Platforms |
| GFab000835 |
CMP |
IPEC/Speedfam |
Auriga / Auriga C |
5-Head Standalone or Integrated CMP Polisher |
| GFab001682 |
Other |
IRVINE OPTICAL |
Ultrasort 606 |
Robotic Bar Code Reader/Wafer Sorter |
| GFab001683 |
Test |
IRVINE OPTICAL |
UltraSpec |
Wafer Inspection Station with Nikon Optiphot 150 Optics,
NeoPlan2 5X, 20X & 100X Obj |
| GFab001684 |
Test |
IRVINE OPTICAL |
UltraSpec III |
Wafer Inspection Station with Nikon Optiphot, DIC Optics,
Isolation Table |
| GFab001555 |
PVD |
IVI |
Box Coater |
48 inch thermal evaporator |
| GFab001229 |
Metrology |
IVS |
200 |
Wafer Inspection System |
| GFab001685 |
Test |
JEOL |
JSM-6360LV |
Scanning Electron Microscope |
| GFab000991 |
Metrology |
Jeol |
JWS 7505 |
CD CEM |
| GFab001482 |
Test |
JEOL |
JWS 7515 |
Microscope |
| GFab001230 |
Metrology |
JEOL |
JWS 7700 |
CD Sem |
| GFab001686 |
Test |
JEOL |
JWS-7515 |
SEM Based Wafer Inspection Tool |
| GFab001287 |
Assembly |
JLSI |
IPS8653D |
JLSI Test Handler |
| GFab001506 |
Test |
JOEL |
JWS-7700 |
|
| GFab001833 |
Test |
JWS 7515 |
JEOL |
|
| GFab001687 |
Assembly |
K&S |
1472 |
Wire Bonder |
| GFab001688 |
Assembly |
K&S |
6497 |
Semi-Automatic Flip Chip Die Bonder |
| GFab001689 |
Assembly |
K&S |
1470-4 |
Automatic Hybrid Wedge Bonder, 200mm x 200mm Travel |
| GFab001690 |
Assembly |
K&S |
1470-4 |
Automatic Hybrid Wedge Bonder, 100mm x 100mm Travel |
| GFab000936 |
Photo |
Karl Suss |
MA150 |
Mask Aligner |
| GFab001691 |
Mask |
KARL SUSS |
MJB-3 |
Mask Aligner with Split-Field Optics, Model 505 UV Power
Supply |
| GFab001692 |
Other |
KARL SUSS |
RA120M |
Wafer Scriber |
| GFab001060 |
Mask |
Karl Suss |
MA-150ML |
Manual Mask Aligner w/ Video Backside Alignment |
| GFab001061 |
Mask |
Karl Suss |
MA56 |
Mask Aligner Exposure System |
| GFab001062 |
Mask |
Karl Suss |
MA6 |
Mask Aligner / Exposure SystemSystem Capable of 2" to
6" Wafers |
| GFab001063 |
Mask |
Karl Suss |
RA120M |
Scriber |
| GFab001231 |
Assembly |
Kensington |
CSMT-2 |
2 Stage Wafer Sorter |
| GFab001693 |
Other |
KETEK |
RMM 530 |
Manual Load Rubbing
Machine for LCDs |
| GFab001422 |
Other |
Kevex |
771 SEMICRON |
|
| GFab000855 |
Test |
Kevex |
Omicron XRF |
|
| GFab000856 |
Test |
Kevex |
Omicron XRF |
|
| GFab001483 |
Assembly |
Kinergy |
Auto Frame Loader |
Assembly Hybrid |
| GFab001484 |
Assembly |
Kinergy |
Auto Frame Loader |
Assembly Hybrid |
| GFab001064 |
Metrology |
Kinetek |
DRS 200 |
Optical Inspection and Defect Review StationSystem Capable of
4" to 8" Wafers |
| GFab001232 |
Metrology |
KLA |
Fab VARS 500 |
Digital Image Management System |
| GFab001517 |
Test |
KLA |
KLA2552 |
1998 |
| GFab001066 |
Metrology |
KLA |
2131 |
Defect Inspection
System Upgraded to 2132 4" to 8" Water Capability |
| GFab001067 |
Metrology |
KLA |
2132 |
High Speed Multilayer Wafer Inspection for Process Defects |
| GFab001065 |
Metrology |
KLA |
Tencor P20H |
Long Scan Profiler Capability to handle 3" to 8"
wafer |
| GFab001074 |
Metrology |
KLA Tencor |
6200 |
Surfscan Wafer Surface Contamination Analyzer Capable up to
8" Wafers |
| GFab001075 |
Metrology |
KLA Tencor |
6220 |
Surfscan Wafer Surface Inspection System 4" to 8"
Water Capability |
| GFab001076 |
Metrology |
KLA Tencor |
6420 |
Surfscan Unpatterned Surface Inspection System Capable up to 8" Wafers |
| GFab001070 |
Metrology |
KLA Tencor |
Alpha Step 200 |
Profiler System
Capability to handle 3" to 8" wafer |
| GFab001077 |
Metrology |
KLA Tencor |
Flexius FLX 2320 |
Thin Film Stress Measurement System Wafer Sizes:100 to 200mm |
| GFab001078 |
Metrology |
KLA Tencor |
M-Gage 300 |
Non-Contact Mettallization Monitor Capability Capability
2" to 6" wafers |
| GFab001071 |
Metrology |
KLA Tencor |
P2 |
Long Scan Profilometer Sample Size: up to 200 mm |
| GFab001080 |
Metrology |
KLA Tencor |
Surfscan 354 |
Capability 2" to 5" wafers |
| GFab001081 |
Metrology |
KLA Tencor |
Surfscan 4500 |
Surface Particle Inspection Analyzer Capability 3" to
6" wafers |
| GFab001082 |
Metrology |
KLA Tencor |
Surfscan 5500 |
Surface Particle Inspection Analyzer Capability 4" to
8" wafers |
| GFab001069 |
Metrology |
KLA Tencor |
Surfscan 7000 |
Pattern particle and microscan |
| GFab001083 |
Metrology |
KLA Tencor |
Surfscan 7200 |
Patterned Wafer Particle Inspection SystemSubstrate Size:
4"to 8 |
| GFab001084 |
Metrology |
KLA Tencor |
Surfscan 7700 |
Surfscan Patterned / Unpatterned Wafer Inspection System |
| GFab001072 |
Metrology |
KLA Tencor |
TF1 |
Film Thickness Measurement System Substrate Size: 4" to
8" |
| GFab001073 |
Metrology |
KLA Tencor |
TF2 |
Film Thickness Measurement System Capability 100 to 200mm
wafer |
| GFab001085 |
Metrology |
KLA Tencor |
UltraPointe 1010 |
Laser Imaging System Defect Review Station- Capable of 4"
to 8" Wafers |
| GFab001897 |
Test |
KLA 2132 |
controller |
Controller |
| GFab001898 |
Test |
KLA 91 |
|
|
| GFab001235 |
Metrology |
KLA TENCOR |
2135 |
Wafer Defect Inspection System |
| GFab001233 |
Metrology |
KLA TENCOR |
HRP 100 |
Profilometer |
| GFab001989 |
Test |
KLA Tencor |
es20XP |
Wafer Inspection |
| GFab001237 |
Metrology |
KLA TENCOR |
eS20XP |
Electronic Beam Wafer Inspection |
| GFab001239 |
Metrology |
KLA TENCOR |
eS20XP |
Electronic beam wafer inspection |
| GFab002004 |
Test |
KLA Tencor |
FLX-5200H |
Stress Guage |
| GFab001234 |
Metrology |
KLA TENCOR |
HRP 220 |
Inspection System |
| GFab001986 |
Test |
KLA Tencor |
KLA-2132 |
Particle Inspection |
| GFab001991 |
Test |
KLA Tencor |
KLA-5300 |
MASK WAFER INSPECTION |
| GFab001238 |
Metrology |
KLA TENCOR |
P20 |
Profile Measurement |
| GFab001236 |
Metrology |
KLA TENCOR |
Quantox |
In-Line Electrical Measurement System |
| GFab001977 |
Test |
KLA Tencor |
SFS-7000 |
Surfscan |
| GFab001996 |
Test |
KLA Tencor |
SURFSCAN AIT-1 |
WAFER INSPECTION |
| GFab000857 |
Test |
KLA-Tencor |
2132 |
|
| GFab001623 |
Test |
KLA-Tencor |
5000 |
Coherence Probe Metrology |
| GFab001835 |
Test |
KLA-TENCOR |
5105 |
|
| GFab000858 |
Test |
KLA-Tencor |
5200 |
|
| GFab000860 |
Test |
KLA-Tencor |
6200 |
|
| GFab001412 |
Metrology |
KLA-Tencor |
6200 |
Surface Scanner |
| GFab000861 |
Test |
KLA-Tencor |
6220 |
|
| GFab000862 |
Test |
KLA-Tencor |
6220 |
|
| GFab001836 |
Test |
KLA-TENCOR |
6400 |
|
| GFab001840 |
Test |
KLA-TENCOR |
7700 |
|
| GFab000863 |
Test |
KLA-Tencor |
7700 |
|
| GFab000864 |
Test |
KLA-Tencor |
7700 |
|
| GFab000865 |
Test |
KLA-Tencor |
7700 |
|
| GFab000859 |
Test |
KLA-Tencor |
5200XP |
|
| GFab001841 |
Test |
KLA-TENCOR |
7700M |
|
| GFab001420 |
Metrology |
KLA-Tencor |
ABI 2000 |
|
| GFab001418 |
Metrology |
KLA-Tencor |
AIT |
|
| GFab001694 |
Test |
KLA-TENCOR |
AlphaStep 300 |
Profilometer |
| GFab001415 |
Metrology |
KLA-Tencor |
CRS-1010S |
|
| GFab001695 |
Test |
KLA-TENCOR |
CRS-3000 |
Confocal Review Station for up to 300mm Wafers |
| GFab001343 |
Test |
KLA-Tencor |
ev300 |
|
| GFab001584 |
Test |
KLA-Tencor |
Flex-5200h |
Automated Thin Film Stress Measurement |
| GFab001586 |
Test |
KLA-Tencor |
HRP-220 |
High Resolution Profiler |
| GFab001436 |
Metrology |
KLA-Tencor |
KLA 2135 |
|
| GFab001433 |
Metrology |
KLA-Tencor |
KLA 3800L |
|
| GFab001012 |
Metrology |
KLA-Tencor |
KLA2130 M/B |
WAFER INSPECTION |
| GFab001013 |
Metrology |
KLA-Tencor |
KLA2130/2111 OPERATION RAC |
| GFab001014 |
Metrology |
KLA-Tencor |
KLA2130/2111 OPERATION RAC |
| GFab001015 |
Metrology |
KLA-Tencor |
KLA2550 REVIEW STATION |
Review Station |
| GFab000997 |
Metrology |
KLA-Tencor |
KLA5107 |
Overlay Inspection System - Parts Machine |
| GFab001595 |
Test |
KLA-Tencor |
Omnimap NC-110 |
Non Contact Resistivity |
| GFab001697 |
Test |
KLA-TENCOR |
P-2 |
Long Scan Profiler |
| GFab001587 |
Test |
KLA-Tencor |
P20H |
Long Scan Profiler Capability to handle 75mm to 200mm wafers |
| GFab001400 |
Metrology |
KLA-Tencor |
P-22 |
Profiler |
| GFab001698 |
Test |
KLA-TENCOR |
P-2H |
Long Scan Profiler with Cassette to Cassette Wafer Handling,
for up to 200mm Wafers |
| GFab001590 |
Test |
KLA-Tencor |
Prometrix FT-600 |
Patterned Wafer Film thickness Measurement |
| GFab001589 |
Test |
KLA-Tencor |
Prometrix FT-700 |
Patterned Wafer Film thickness Measurement |
| GFab001596 |
Test |
KLA-Tencor |
Prometrix RS35 |
Resistivity Mapping system 4 Point Probe |
| GFab001597 |
Test |
KLA-Tencor |
Prometrix RS50/E |
4 Point Probe, High Resistivity |
| GFab001598 |
Test |
KLA-Tencor |
Prometrix RS55/TC |
4 Point Probe, High Resistivity Mapping w/ Temp Compensation |
| GFab001591 |
Test |
KLA-Tencor |
Prometrix UV-1050 |
Film Thickness Mapping |
| GFab001699 |
Test |
KLA-TENCOR |
RS55 |
Resistivity Mapping Tool, for Copper Only |
| GFab001421 |
Metrology |
KLA-Tencor |
RS55 |
Resistivity |
| GFab001009 |
Metrology |
KLA-Tencor |
Sufscan 7200 |
Patterned Wafer
Particle Counter |
| GFab001010 |
Metrology |
KLA-Tencor |
Sufscan 7200 |
Patterned Wafer
Particle Counter |
| GFab001601 |
Test |
KLA-Tencor |
Surfscan 5500 |
Wafer Contamination Monitor |
| GFab001602 |
Test |
KLA-Tencor |
Surfscan 6100 |
Unpatterned Wafer Surface Contamination Analyzer |
| GFab001604 |
Test |
KLA-Tencor |
Surfscan 6200 |
Wafer Surface Analyzer for Non Patterned Wafers |
| GFab001605 |
Test |
KLA-Tencor |
Surfscan 6400 |
Wafer Surface Analyzer for Contaminating Particles |
| GFab001603 |
Test |
KLA-Tencor |
Surfscan 7000 |
Patterned Wafer Contamination Analyzer |
| GFab001606 |
Test |
KLA-Tencor |
Surfscan 7600 |
Particle Inspection for Patterned and Unpatterned Wafers |
| GFab001600 |
Test |
KLA-Tencor |
Surfscan AIT |
Advanced inline
Defect Inspection |
| GFab001700 |
Test |
KLA-TENCOR |
Surfscan SP1 Classic |
Unpatterned Wafer Surface Inspection Tool, for 200mm-300mm
Wafers |
| GFab001701 |
Test |
KLA-TENCOR |
Surfscan7700 |
| Patterned
Wafer Surface Inspection Tool, for up to 200mm Wafers |
|
| GFab000866 |
Test |
KLA-Tencor |
UV 1050 |
|
| GFab000867 |
Test |
KLA-Tencor |
UV 1050 |
|
| GFab000868 |
Test |
KLA-Tencor |
UV 1050 |
|
| GFab001011 |
Metrology |
KLA-Tencor Prometrix |
FT 650 |
FILM Thickness
MEASUREMENT SYSTEM |
| GFab001428 |
Diffusion |
Kokusai |
VERTRON III |
|
| GFab001344 |
Diffusion |
Kokusai |
Vertron
III(F)/Vertex(F)/DD-823V/DJ-823V |
| GFab001345 |
Diffusion |
Kokusai |
Vertron V(S)/Vertex
V(S)/DD-835V/DJ-835V |
| GFab001346 |
Diffusion |
Kokusai |
Vertron V(S)/Vertex
V(S)/DD-835V/DJ-835V |
| GFab001936 |
Diffusion |
KOYO |
VF-5100B |
VERTICAL ALLOY FURNACE |
| GFab001934 |
Diffusion |
KOYO Lindberg |
VF-5100 |
Oxide Furnace |
| GFab001288 |
Test |
KVD |
M2i |
KVD Tester |
| GFab001818 |
Etch |
LAM |
490 |
Poly Oxide Etcher |
| GFab000943 |
Etch |
LAM |
590 |
Oxide Etcher |
| GFab001245 |
Etch |
Lam |
2300 |
Etcher - Transfer Module - TM |
| GFab001240 |
Etch |
Lam |
4420 |
Polysilicon Etcher |
| GFab001241 |
Etch |
Lam |
4420 |
Polysilicon Etcher |
| GFab001414 |
Etch |
Lam |
4428 |
Etcher |
| GFab001408 |
Etch |
LAM |
4528 |
Etcher |
| GFab001852 |
Etch |
LAM |
9408 |
Etcher |
| GFab001830 |
Etch |
LAM |
9600SE |
|
| GFab001242 |
Etch |
Lam |
9600SE |
Metal Etcher |
| GFab001243 |
Etch |
Lam |
Alliance 9400 PTX |
1-chamber system |
| GFab001244 |
Etch |
Lam |
Alliance A6 |
|
| GFab000950 |
CVD |
LAM |
DSM9800 |
LPCVD Reactor 1 Integrity |
| GFab001702 |
Etch |
LAM |
TCP 9600SE |
Plasma Metal Etch System |
| GFab001509 |
Etch |
LAM |
TCP9600 |
|
| GFab001930 |
Etch |
LAM |
TCP-9608SE |
METAL Etch |
| GFab001574 |
Etch |
LAM |
4600B |
Aluminum Etcher, 200mm |
| GFab001413 |
CMP |
LAM / Drytek |
LRC 200 SERIES 0 |
Etcher |
| GFab000990 |
CMP |
LAM / Ontrak |
DSS 200 |
Post CMP
cleaner/MTSC-1 SCRUBBER |
| GFab001703 |
Etch |
LAM RESEARCH |
4420 |
Polysilicon Plasma Etcher for 150mm Wafers |
| GFab001440 |
Etch |
Lam Research |
9400 |
|
| GFab001437 |
Test |
Lambda Physik |
A4003 |
Excimer Laser- 193nm (ArF) Excimer laser for lithography
applications. This is a 5 Watt 4Khz laser with a 0.3pm Bandwidth spec. |
| GFab001704 |
Assembly |
LAURIER |
DS-3000 |
Autonmatic Die Attacher |
| GFab001463 |
Assembly |
Laurier |
DS-7000 |
Pick and Place |
| GFab001347 |
Test |
Leica |
INS 2000 |
|
| GFab000869 |
Test |
Leica |
MIS 200 |
|
| GFab000870 |
Test |
Leica |
MIS 200 |
|
| GFab000871 |
Test |
Leica |
MIS 200 |
|
| GFab001615 |
Test |
Leica |
MIS200 |
Wafer Inspection and Review |
| GFab001474 |
Test |
Leitz |
MPV-SP |
Microspectroscope |
| GFab001475 |
Test |
Leitz |
SP Automatic |
Microspectroscope |
| GFab001087 |
Metrology |
Leitz |
Ergolux |
Microsciope 6 inch Stage |
| GFab001999 |
Test |
LEO |
LTA-700 |
Life-time Measurement |
| GFab001289 |
Subsystem |
Lepel |
J-125-3-KC-TL |
Lepel RF Generator (228KVA) |
| GFab001290 |
Subsystem |
Leybold |
100P |
Leybold Dry Vacuum Pump |
| GFab001293 |
Subsystem |
Leybold |
D30A |
Leybold D30A Vacuum Pump |
| GFab001291 |
Subsystem |
Leybold |
D60A |
Leybold D60A Vacuum Pump |
| GFab001292 |
Subsystem |
Leybold |
WSU150 |
Leybold WSU150 blower |
| GFab001560 |
PVD |
Leybold |
Z 660 |
Load Locked 4 Target RF and DC Sputter with Etch |
| GFab001705 |
Other |
LFE |
PDS-504 |
Plasma Cleaning Tool |
| GFab001706 |
Other |
LFE |
PUC-301 |
Plasma Cleaning Tool |
| GFab001088 |
Ovens |
Linberg |
|
Blue OvenChamber Size: 25"H x 16"D x 22"WMax
Temp: 300c |
| GFab001859 |
Test |
LMS IPRO |
Leica |
|
| GFab001632 |
Assembly |
LTX |
Delta Turboflex |
|
| GFab001707 |
Other |
LUMONICS |
WaferMark 2 |
YAG Laser Wafer Marking System |
| GFab001708 |
Other |
LUMONICS |
WaferMark 200HS |
YAG Laser Wafer Marker for up to 200mm Wafers |
| GFab001709 |
Other |
LUMONICS |
WaferMark 345-1 |
YAG Laser Wafer Marking System |
| GFab001710 |
Other |
LUMONICS |
WaferMark 345-2 |
YAG Laser Wafer Marking System |
| GFab001611 |
Other |
Lumonics |
Wafermark II |
Laser ID System |
| GFab001089 |
Other |
Lumonics |
Wafer Mark II |
Laser Identification System Capable of handling 2" to
6" wafers. |
| GFab001843 |
Mask |
MA6 |
Karl-Suss |
Mask Aligner |
| GFab001090 |
Subsystem |
Mactronix |
AWS BWI 600 |
Microscope Loader / UV Inspection System |
| GFab001348 |
Wet |
Marangoni |
Dryer |
|
| GFab001854 |
Etch |
Mark 7 |
TEL |
Polymide 2 coater, 2 developer |
| GFab001853 |
Etch |
Mark 8 |
TEL |
Polymide 2 coater, 2 developer |
| GFab001711 |
Assembly |
MAT |
6947 |
Semi-Automatic Flip Chip Die Bonder |
| GFab001571 |
Etch |
Matrix |
System One, Model 303 |
Etcher |
| GFab000987 |
Wet |
Mattson |
CFM 8100 |
Wet Station |
| GFab001370 |
Assembly |
MC Electronics |
JLSI 8990 |
|
| GFab001712 |
Test |
MC SYSTEMS |
8806 |
Analytical Probing System w/B/L MicroZoom Microscope, 2.25X,
8X, 25X Objectives |
| GFab001807 |
Test |
MCT |
2010 |
Tester |
| GFab001713 |
Test |
MDC |
CSM/16 |
Automatic CV Plotter with 150mm DuoChuck, B&L SZ5 Microscope |
| GFab001714 |
Test |
MDC |
CSM/2-7200 |
Automatic CV Plotter with DuoChuck 8512-6NI 150mm Nickel
Plated 6' (dia.) Dual Hot Chuck, Boonton 7200 Capacitance Meter
|
| GFab001715 |
Test |
MDC |
CSM/2-WIN-VF6-OS1 |
Automatic CV Plotter with 490 QuietChuck 200mm DC Hot Chuck,
H-P 4140B pA Meter/DC Voltage Source & H-P 4284A 20Hz – 1Mhz Precision
LCR Meter
|
| GFab001716 |
Etch |
MERCATOR CONTROL |
LF-5 |
Plasma Stripper |
| GFab001093 |
Assembly |
Micro Automation |
1100 |
Wafer Dicing SawCapable 3" to 6" Wafers |
| GFab001091 |
Assembly |
Micro Automation |
1006 |
Programmable Dicing SawWafer dimensions 2"- 6" |
| GFab001092 |
Assembly |
Micro Automation |
1006 |
Programmable Dicing SawWafer
dimensions 2"- 6" |
| GFab001297 |
Metrology |
Microanalyst |
7500 |
Microanalyst 7500 Masspectrometer |
| GFab001976 |
Test |
Micronics Japan |
705A |
Manual Prober |
| GFab000872 |
Test |
MicroVu |
H14 |
|
| GFab001802 |
Photo |
MIT |
Flexifab |
Coater |
| GFab001803 |
Photo |
MIT |
Flexifab |
Developer |
| GFab001851 |
Photo |
MKII |
TEL |
Developer |
| GFab001858 |
Test |
Molecular Analytics |
47-NH3/NMP-102B-121 |
ION Mobility Spectrometer |
| GFab001498 |
Assembly |
Mosaid |
3480 tester |
36 I/O- 144M Fail Bit Memory |
| GFab001499 |
Assembly |
Mosaid |
3480 tester |
18 I/O-18M Fail Bit Memory |
| GFab001497 |
Assembly |
Mosaid |
3480 testers |
(36 I/O- 36M Fail Bit Memory) |
| GFab001496 |
Assembly |
Mosaid |
3490 tester |
36 I/O -36M Fail Bit Memory |
| GFab001566 |
PVD |
MRC |
603 |
3 Target RF & DC Side Sputtering Etch |
| GFab001565 |
PVD |
MRC |
662 |
Sideways Sputter |
| GFab001563 |
PVD |
MRC |
903M |
Sputtering System DC w/RF Etch |
| GFab001094 |
PVD |
MRC |
603 |
Sputter SystemCapable up to 6" Wafers |
| GFab001562 |
PVD |
MRC |
603-II |
Side sputtering System w/ Etch |
| GFab001564 |
PVD |
MRC |
603-III |
Side sputtering System w/ RF Etch |
| GFab001896 |
PVD |
MRC 662 |
|
Sputter |
| GFab001561 |
PVD |
MRC/TSC |
943 |
Load locked 3 Target DC Sputtering system |
| GFab001717 |
CVD |
MRL INDUSTRIES |
1024 |
2- Tube Horizontal Diffusion Furnace, 150mm Wafers |
| GFab001718 |
CVD |
MRL INDUSTRIES |
1024 |
3-Tube Horizontal Diffusion Furnace w/Cantilever Loaders,
150mm Wafers |
| GFab001719 |
CVD |
MRL INDUSTRIES |
14TC-45 |
SMD IR Conveyor Furnace, 5 Zones, 9" Long Clamshell
Chamber Design, MPU Controlled |
| GFab001095 |
Test |
MRL Industries |
Model SLC 1248 |
Diffusion Furnace Capable up to 200mm wafers |
| GFab001096 |
Metrology |
Nanometric |
4150 |
Film Thickness Measurement and Mapping SystemSystemStandard
wafer sizes 100mm to 200mm |
| GFab001247 |
Metrology |
Nanometrics |
181 |
Film Thickness Measurement System |
| GFab001720 |
Test |
NANOMETRICS |
Nanoline CD-50 |
CD Measurement Tool |
| GFab001721 |
Test |
NANOMETRICS |
Nanospec 181 |
Film Thickness Measurement System |
| GFab001722 |
Test |
NANOMETRICS |
Nanospec 181 |
Film Thickness Measurement System |
| GFab001723 |
Test |
NANOMETRICS |
Nanospec 200 |
Film Thickness Measurement System |
| GFab001098 |
Metrology |
Nanometrics |
Nanospec 210 |
Film Thickness Measurement System Capable 5" to 6" Wafers |
| GFab001724 |
Test |
NANOMETRICS |
Nanospec 8300 |
Automatic Film Thickness Tool, Cassette to Cassette for up to
200mm Wafers |
| GFab001725 |
Test |
NANOMETRICS |
Nanospec 9000 |
Automatic In Situ Film Thickness Tools, 3ea Available |
| GFab001246 |
Metrology |
Nanometrics |
Nanospec 9000(7000-0560) |
Integrated Film Analysis System. |
| GFab001592 |
Test |
Nanometrics |
Nanospec AFT 4000 |
Scanning UV |
| GFab001097 |
Metrology |
Nanometrics |
8300XP |
Thin Film MetrologyCapable of 100mm-300mm wafer handling |
| GFab001298 |
Subsystem |
Neslab |
CTF-75 |
Neslab Coolflow CTF-75 Chiller |
| GFab001299 |
Subsystem |
Neslab |
HX-150 |
Neslab HX-150 Chillers |
| GFab001300 |
Subsystem |
Neslab |
HX-75 |
Neslab HX-75 Chillers |
| GFab001302 |
Subsystem |
Neslab |
RTE210 |
Neslab RTE210 Chillers |
| GFab001301 |
Subsystem |
Neslab |
RTE211 |
Neslab RTE211 Chillers |
| GFab001099 |
Subsystem |
Neslab |
CoolFlow RTE-221 |
| GFab001100 |
Subsystem |
Neslab |
DI Max |
|
| GFab001101 |
Subsystem |
Neslab |
HX 150 |
Recirculating Chiller |
| GFab001102 |
Subsystem |
Neslab |
HX 300 |
Recirculating Chiller |
| GFab001624 |
Test |
Newport |
Autoalign PCS |
|
| GFab001864 |
|
Nextral 100 |
Nextral |
|
| GFab001726 |
Test |
NICOLET |
ECO-DX |
FT-IR Spectrometer for Carbon, Oxygen & Epi Analysis,
As-Is Only |
| GFab001727 |
Test |
NICOLET |
ECO-MX 160-10MX |
FT-IR Spectrometer, As-Is Only |
| GFab001303 |
Metrology |
Nicolet |
MX-ECO |
Nicolet MX-ECO |
| GFab001985 |
Test |
NIDEK |
IM-7 |
Wafer Inspection |
| GFab001380 |
Metrology |
Nikon |
3A |
|
| GFab001907 |
Photo |
NIKON |
i9 |
i-Line stepper |
| GFab001728 |
Test |
NIKON |
Metaphot |
Binocular Microscope with 5X, 20X, 40X & 60X BF/DF Obj.
Lenses, Polaroid Camera |
| GFab001397 |
Photo |
Nikon |
NPI 4425I |
|
| GFab001410 |
Metrology |
Nikon |
NPI S202+ |
Stepper |
| GFab001908 |
Photo |
NIKON |
NSR2005i10C |
i-Line stepper |
| GFab001916 |
Photo |
Nikon |
NSR-2205i11D |
STEPPER |
| GFab001917 |
Photo |
Nikon |
NSR-2205i11D |
STEPPER |
| GFab001918 |
Photo |
Nikon |
NSR-2205i11D |
STEPPER |
| GFab001912 |
Photo |
Nikon |
NSR-2205I12D |
STEPPER |
| GFab001911 |
Photo |
Nikon |
NSR-2205i14E |
STEPPER |
| GFab001914 |
Photo |
Nikon |
NSR-2205I14E |
STEPPER |
| GFab001729 |
Test |
NIKON |
NWL-851 |
Cassette Wafer Loaders for up to 200mm Wafers, 3ea Available |
| GFab001730 |
Test |
NIKON |
Optiphot 66 |
Trinocular Numarski Microscope with 5X, 20X, 40X & 100X
DIC Obj. Lenses, AFX-II Polaroid Camera |
| GFab001731 |
Test |
NIKON |
Optiphot 66 |
Binocular Microscope with 5X, l0X, 20X & 40X Obj. Lenses |
| GFab001732 |
Test |
NIKON |
Optiphot 66 |
|
| GFab001733 |
Test |
NIKON |
Optiphot 88 |
Binocular Microscope with 5X, l0X, 20X & 40X Obj. Lenses,
for 200mm Wafers |
| GFab001987 |
Test |
NIKON |
Optistation |
Wafer Inspection |
| GFab001988 |
Test |
NIKON |
Optistation |
Wafer Inspection |
| GFab001734 |
Test |
NIKON |
Optistation 2A |
Automatic Wafer Inspection Systems for 75mm- 150mm Wafers,
Auto Focus, 4ea Available |
| GFab001735 |
Test |
NIKON |
Optistation 3A |
Automatic Wafer Inspection Station for 200mm Wafers, 2ea
Available |
| GFab001997 |
Test |
Nikon |
OST-5 |
Optistation |
| GFab001736 |
Test |
NIKON |
|
Toolmaker's Microscope |
| GFab001103 |
Test |
Nikon Metaphot |
|
Microscope 6 inch Stage |
| GFab001737 |
Assembly |
NITTO DENKO |
D-304 |
Automatic Wafer Taper |
| GFab001738 |
Assembly |
NITTO DENKO |
H-304 |
Automatic Wafer Detaper |
| GFab001895 |
PVD |
Nordicko |
8550 |
Sputter |
| GFab001556 |
PVD |
Nordiko |
8550 |
RF and DC Sputtering System |
| GFab000840 |
Test |
Nova |
NovaScan 210/420/840 |
Standalone or Integrated Polish Configurations |
| GFab001401 |
CMP |
Novellus |
676 |
Planer |
| GFab000873 |
CVD |
Novellus |
C2 Altus |
|
| GFab000875 |
CVD |
Novellus |
C2 Sequel - 1 shrink
chamber |
| GFab000874 |
CVD |
Novellus |
C2 Sequel - non shrink |
| GFab000876 |
CVD |
Novellus |
C2 SPEED/Sequel |
| GFab001958 |
CVD |
NOVELLUS |
Concept 2 Dual Speed S |
SIN CVD |
| GFab001900 |
CMP |
Novellus IPEC Speedfam |
676 |
CMP 200mm |
| GFab001879 |
CMP |
Novellus IPEC Speedfam |
Novascan 372 ILD |
CMP 200mm |
| GFab001880 |
CMP |
Novellus IPEC Speedfam |
Novascan 372 ILD |
CMP 200mm |
| GFab001881 |
CMP |
Novellus IPEC Speedfam |
Novascan 372 ILD |
CMP 200mm |
| GFab001882 |
CMP |
Novellus IPEC Speedfam |
Novascan 372 ILD |
CMP 200mm |
| GFab001409 |
CMP |
Novellus/Ipec/Speedfam |
372M |
Planer |
| GFab001740 |
Test |
OLYMPUS |
BH2-MJL |
Wafer Inspection Microscope with NeoSPlan 5X, 10X, 20X &
50X Objectives, for 150mm Wafers |
| GFab001741 |
Test |
OLYMPUS |
BHM |
Wafer Inspection Microscope with NeoSPlan 5X, 10X, 20X &
50X Objectives |
| GFab001104 |
CMP |
OnTrack |
DSS-200 |
Slli Series IIDouble Sided Scrub Track.Capable 4" to
8" wafers |
| GFab000833 |
CMP |
OnTrak |
DSS 200 Series 2 |
Post CMP Cleaner |
| GFab000834 |
CMP |
OnTrak |
DSS 200 Synergy |
Post CMP Cleaner |
| GFab000877 |
CMP |
OnTrak |
DSS-200 Series 1 |
|
| GFab000878 |
CMP |
OnTrak |
DSS-200 Series 1 |
|
| GFab001305 |
Metrology |
Opal |
7830i |
Opal 7830i Sem (Parts Tool) |
| GFab001855 |
Test |
OPAL 7830i |
APPLIED MATERIALS |
CD SEM |
| GFab001016 |
Metrology |
Orbis |
Wed |
WAFER INSPECTION |
| GFab001248 |
Metrology |
OSI |
2100 |
Overlay and CD Measurement System |
| GFab000998 |
Metrology |
OSI |
IQ-155M |
PARTICLE MEASUREMENT |
| GFab000999 |
Metrology |
OSI |
IQ-155M |
PARTICLE MEASUREMENT |
| GFab001000 |
Metrology |
OSI |
IQ-155M |
PARTICLE MEASUREMENT |
| GFab000842 |
Test |
OSI |
Metra |
Overlay and CD measurement system |
| GFab000841 |
Test |
OSI |
VLS-I |
Video line width CD measurement system |
| GFab001570 |
Etch |
Oxford Instruments |
200 |
Ion Beam Milling system |
| GFab001569 |
Etch |
Oxford Instruments |
100 Plus |
RIE Reactive Ion Etching system w/ Loadlock |
| GFab001349 |
Etch |
Oxford Instruments |
CMI 900 |
|
| GFab001572 |
Etch |
Oxford Instruments |
Plasmalab 80 Plus |
Compact Flexible Reactive Ion Etcher |
| GFab001839 |
Test |
P2 |
KLA-TENCOR |
|
| GFab001805 |
CVD |
P5000 |
APPLIED MATERIALS |
TEOS w/ Phase 4 bot box |
| GFab001817 |
Etch |
P5000 |
APPLIED MATERIALS |
4 Chamber Sputter Etch |
| GFab001804 |
Etch |
P5000 |
APPLIED MATERIALS |
Trench Etch |
| GFab001849 |
Etch |
P5000 Metal Etch |
APPLIED MATERIALS |
2 Metal etch, 1 ASP |
| GFab001105 |
Metrology |
Pacific Western System |
Probe II |
Capable 4" to 6" |
| GFab001106 |
Metrology |
Pacific Western System |
Probe P5 |
|
| GFab001364 |
Thin Films |
Parker |
AUTODOSER |
Autodoser |
| GFab001108 |
Mask |
Perkin Elmer |
300 |
Micralign Projection AlignerCapable of 3" to 5 |
| GFab001109 |
PVD |
Perkin Elmer |
4400 |
|
| GFab001110 |
PVD |
Perkin Elmer |
4410 |
|
| GFab001567 |
PVD |
Perkin Elmer |
4450 |
3 Target DC Sputtering |
| GFab001107 |
Metrology |
Perkin Elmer |
2000 FTIR |
SpectrophotometerSystem Capable of 6"and 8" and
12" Wafers |
| GFab001250 |
Metrology |
Perkin Elmer |
544HT |
Projection Aligner |
| GFab001249 |
Metrology |
Perkin Elmer |
641HT |
Projection
Aligner Split Carriage Capable of 150 mm |
| GFab001742 |
PVD |
PERKIN-ELMER |
2400-8J |
RF Sputtering System, 3ea 200mm Targets, RF Etch, RF Bias |
| GFab001610 |
Test |
Philips |
PLM-100 |
Photoluminescence Mapping Tool |
| GFab001743 |
Test |
PHILLIPS |
PW2800 |
Xray Fluorescence Metrology Tool for up to 200mm Wafers |
| GFab001625 |
Test |
Phoenix |
160 OVHM |
PCBA Analyzer, X-Ray
Inspection |
| GFab001876 |
Etch |
Plasma 300 |
Tepla |
GaN Bluechip, 2 and 4 inch, CE Marking |
| GFab001466 |
Etch |
Plasma Technologies |
ECR 2000/300 OR |
Single Chamber Plasma Etch |
| GFab001111 |
Etch |
PlasmaTherm |
740 |
RIE |
| GFab001251 |
CVD |
Plasmatherm |
SL 730 |
Pecvd |
| GFab001252 |
CVD |
Plasmatherm |
SLR 730 |
Pecvd |
| GFab001744 |
Test |
PLASMA-THERM |
Waf'r Batch 74 |
RIE/Parallel Plasma Etcher |
| GFab001551 |
PVD |
Plasmatron |
|
Electron Beam Evaporator |
| GFab000851 |
Subsystem |
PRI Automation |
1000- 2000- 4000- 5000 |
New and refurbished robot |
| GFab001745 |
Test |
PROMETRIX |
FT-750 |
Film Thickness Measuring Tool |
| GFab001746 |
Test |
PROMETRIX |
RS-35c |
Resistivity Mapping Tool |
| GFab001747 |
Test |
PROMETRIX |
RS-55 |
Resistivity Mapping Tool |
| GFab001112 |
Metrology |
Prometrix |
FT530 |
Film Thickness Mapping SystemWafer Sizes: 3-3.25" and
100- 125-150-200 mm |
| GFab001113 |
Metrology |
Prometrix |
FT650 |
Film Thickness Mapping System Standard Wafer Sizes:
3-3.25" and 100-125- 150- 200mm |
| GFab001114 |
Metrology |
Prometrix |
RS35C |
Resistivity Mapping System 4"- 8" Capable |
| GFab001115 |
Metrology |
Prometrix |
RS35C |
Resistivity Mapping System-Cassette to Cassette Load 4 Point
Probe4"- 8" Capable |
| GFab001116 |
Metrology |
Prometrix |
RS55 |
Resistivity Mapping SystemWafer size 2" - 8" Manual
Load |
| GFab001117 |
Metrology |
Prometrix |
RS55 TC |
Resistivity Mapping SystemWafer size 2" - 8" Manual
Load |
| GFab001118 |
Metrology |
Prometrix |
SM300 |
Film Thickness Mapping SystemSystemMaximum wafer size 200mm |
| GFab001890 |
Test |
Prometrix |
RS50 |
|
| GFab001891 |
Test |
Prometrix |
SM300 |
|
| GFab001748 |
Assembly |
PS SYSTEMS |
FPS6000 |
Trim & Form Press, 5ea Available |
| GFab001749 |
Assembly |
PS SYSTEMS |
M-Press |
Trim & Form Press, 4ea Available |
| GFab001620 |
Assembly |
Pyramid Engineering |
HPS-9000 |
Seam Sealer |
| GFab001306 |
Mask |
QC Optics |
API-3000 |
QC Optics Photo Mask Inspection System |
| GFab001834 |
Test |
Quantox 64000 |
KLA-TENCOR |
|
| GFab001500 |
Assembly |
Quickturn System |
16500BR |
|
| GFab001375 |
Assembly |
Recif |
IDLW8 |
Handler |
| GFab001750 |
Assembly |
REDDISH ELECTRONICS |
SM500 CXE |
Convection Reflow Oven |
| GFab001751 |
Test |
REICHERT |
Polylite SC |
Wafer Inspection Microscope with 10X, 20X, 50X & 100X Plan
Fluor Objective Lenses, Irvine Optical Ultrastation 3.C Model 2 Cassette
Loader, for up to 150mm Wafers |
| GFab001752 |
Other |
REID-ASHMAN |
60 Pin |
Test Head Manipulator |
| GFab001634 |
Assembly |
Reliability Line |
various |
Various ovens, temp cycle, humidity cycle used for
microelectronics testing |
| GFab001862 |
Etch |
RIE |
OXFORD INSTRUMENTS |
| GFab001753 |
Test |
RIGAKU |
3630 |
TXRF Wafer Analyzer |
| GFab001754 |
Test |
RIGAKU |
3630 |
TXRF Wafer Analyzer |
| GFab001755 |
Test |
RIGAKU |
3750 |
TXRF Wafer Analyzer |
| GFab001756 |
Test |
RIGAKU |
3700H |
TXRF Wafer Analyzer |
| GFab001002 |
Metrology |
Rigaku |
3700H |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001001 |
Metrology |
Rigaku |
3726B |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001757 |
Test |
RIGAKU |
DPGS |
Xray Diffractometer, 2ea Available |
| GFab001758 |
Test |
RIGAKU |
Wafer X 300 |
XRF Film Thickness& Composition Tool, FOUP Loading of
300mm Wafers |
| GFab001943 |
Wet |
Riken Medic |
DBS-160S |
Draft chamber of IPA cleaner |
| GFab001120 |
Metrology |
Rudolph |
Auto EL IV |
Ellipsometer w/ Automatic R-06 StageMaximum wafer size 150mm |
| GFab002003 |
Test |
Rudolph |
FE-Ⅳ/D |
Ellipsometer |
| GFab001594 |
Test |
Rudolph |
FE-III |
Focus Ellipsometer |
| GFab001366 |
Metrology |
Rudolph |
METAPULSE 200 |
| GFab001593 |
Test |
Rudolph |
Spectralaser 200XLS |
Simultaneous multi angle, multi wavelength Ellipsometer w/
fully integrated UV Reflectometer |
| GFab001119 |
Metrology |
Rudolph |
Auto EL III |
EllipsometerMaximum wafer size 150mm |
| GFab001759 |
Test |
RUDOLPH RESEARCH |
FE-III |
Focused Beam Ellipsometer, for up to 200mm Wafers |
| GFab000879 |
Test |
Rudolph Research |
FE-IV |
|
| GFab000880 |
Test |
Rudolph Research |
FE-IV |
|
| GFab000881 |
Test |
Rudolph Research |
Metapulse 200 |
|
| GFab000843 |
Test |
Rudolph Technologies |
AutoEL III |
Manual benchtop single wavelength ellipsometer up to 6" |
| GFab000844 |
Test |
Rudolph Technologies |
AutoEL IV |
Manual benchtop multi wavelength ellipsometer up to 6" |
| GFab000845 |
Test |
Rudolph Technologies |
FE III |
Automated- pattern rec-single wavelength ellipsometer up to
8" |
| GFab000846 |
Test |
Rudolph Technologies |
FE IV |
Automated-pattern rec- single wavelength ellipsometer up to
8" |
| GFab000847 |
Test |
Rudolph Technologies |
FE VII |
Automated- pattern rec- single wavelength ellipsometer up to
8" |
| GFab000848 |
Test |
Rudolph Technologies |
SpectraLASER 200 |
Multi wavelength laser ellipsometer and full spectrum
reflectometer |
| GFab001760 |
Assembly |
RVSI |
Vanguard VAi 6000 |
BGA Solder Ball Placement System w/Vai 100 Loading System |
| GFab001761 |
Test |
SAGAX |
Isoscope 125 |
Film Thickness Monitor |
| GFab001762 |
CMP |
SAGITTA |
ECP-2000 |
Cross Section Polisher |
| GFab001350 |
Wet |
Santa Clara Plastics (SCP) |
E200 |
|
| GFab001815 |
Wet |
Santa Clara Plastics (SCP) |
SCP |
Wetsink for Descum |
| GFab001456 |
Test |
Schlumberger |
BLU2K |
|
| GFab001457 |
Test |
Schlumberger |
BLU300EI |
|
| GFab001458 |
Test |
Schlumberger |
BLU300EI |
|
| GFab001374 |
Test |
Schlumberger |
IDS 10000PLUS |
|
| GFab001121 |
Metrology |
Schlumberger |
IVS 100 |
Automated Metrology System
Wafer Sizes: 100 to 200mm |
| GFab001395 |
Assembly |
Schlumberger |
NA |
Handler |
| GFab001435 |
Photo |
Scientific Instruments |
1LM21H |
|
| GFab001763 |
Test |
SDI |
FAaST 230 |
Surface Photo Voltage Test System with COCOS |
| GFab001764 |
Test |
SDI |
FAaST 230-DP+SPV |
Surface Photo Voltage Test System with COCOS & SILC |
| GFab001765 |
Test |
SDI |
FAaST 330 |
Dielectric Charaterization Tool with COCOS, SILC & Epi-t
for up to 300mm Wafers |
| GFab001766 |
Test |
SDI |
SPV 1020 |
Surface Photo Voltage Tester |
| GFab001767 |
Test |
SDI |
SPV-300 |
Surface Photo Voltage Tester for up to 300mm Wafers |
| GFab001388 |
Test |
Seiko |
CQDP-40 CLN |
|
| GFab001501 |
Assembly |
Seiko Instruments Inc. |
SMI 9800 |
High Performance Scanning Ion Microscope |
| GFab001122 |
Metrology |
SelA MC |
100 |
Micro Cleavage System Capable up to 6" wafers |
| GFab000882 |
|
SemiFab |
CD-E1/750 |
|
| GFab001123 |
Subsystem |
SemiGas |
2 |
Cylinder Cabinet with Purge Controller |
| GFab000849 |
Test |
SemiTest |
SCA2000 |
Surface charge analyzer for real time C-V testing |
| GFab001599 |
Test |
Semitest |
SCA-2500 |
Real time Surface Charge Analyzer |
| GFab001941 |
Wet |
SEMITOOL |
0870F-3-1-E-ML |
Dual Rinser Dryer |
| GFab000986 |
Wet |
Semitool |
Equinox |
HF Vapor Cleaner |
| GFab001351 |
Other |
Semitool |
LT-312 |
|
| GFab000883 |
Wet |
Semitool |
Magnum |
|
| GFab001940 |
Wet |
SEMITOOL |
MILLENIUM300 |
Wafer spin cleaner |
| GFab001379 |
Etch |
Semitool |
MILLENNIUM |
|
| GFab001124 |
Wet |
Semitool |
SAT 205ID |
Spray Acid tool Accommodates 6" substrate |
| GFab001125 |
Wet |
Semitool |
SAT 208 (2P) |
Spray Acid Tool Accommodates 6" substrate |
| GFab001126 |
Wet |
Semitool |
SAT 3061D |
Spray Acid Tool Accommodates 6" substrate |
| GFab001127 |
Wet |
Semitool |
ST-860D |
Capable of 2" to 5" Wafers |
| GFab001768 |
Wet |
SEMITOOL |
ST860F |
Spin Rinser Dryer with PSC-101 Controllers, 2ea Available |
| GFab001769 |
Wet |
SEMITOOL |
ST860F |
Spin Rinser Dryer with PSC-102 Controllers |
| GFab001770 |
Wet |
SEMITOOL |
ST-870D |
Dual Stack Spin Rinse Dryer |
| GFab000981 |
Diffusion |
Semitool |
VTP 1500 |
Furnace |
| GFab001128 |
Wet |
Semitool |
WST 306 |
Wafer Soluble Develop/Strip Tool Capability of 100mm - 125mm
wafer |
| GFab001427 |
Photo |
Semitool |
WST 308 |
|
| GFab001129 |
Wet |
Semitool |
WST 308 |
Wafer Soluble
Develop/Strip Tool Capability of 100mm - 125mm wafer |
| GFab001514 |
Wet |
SEMITOOL |
WST305M |
|
| GFab001254 |
Diffusion |
Semitool |
Semitherm VTP Anneal |
Vertical Furnace |
| GFab001813 |
Photo |
Semix |
Semix |
SOG Tracks made by TOK non U line |
| GFab001863 |
Wet |
SEZ |
201 |
|
| GFab001255 |
Wet |
SEZ |
RST 201 |
Wet Etcher |
| GFab001256 |
|
Shibaura |
CDE80 |
CDE80 |
| GFab001017 |
Test Assebley |
Shinkawa |
SFB200 |
Flip Bonder 150mm |
| GFab001771 |
Assembly |
SHINKO |
BGA-BA-1 |
BGA Mounting Tool |
| GFab001772 |
Assembly |
SHINKO |
BGA-BM-2 |
BGA Alignment Tool |
| GFab001130 |
Metrology |
Sloan |
Dektak II |
Precision Surface Profile Measuring SystemCapable up to
6" wafers |
| GFab001131 |
Metrology |
Sloan |
Dektak IIA |
Surface Profile Measuring System |
| GFab001132 |
Metrology |
Sloan |
Veeco Dektak 3030 |
Surface Profile Measuring SystemCapable up to 6" wafers |
| GFab001133 |
Photo |
Solitec |
8260-CB |
Coat Vacuum Bake Track 2" to 5" Wafer Capacity. |
| GFab001773 |
Test |
SOPRA |
ES-4G |
Spectroscopic Ellipsometer |
| GFab001832 |
CMP |
Speedfam/IPEC |
372 |
|
| GFab001352 |
CMP |
SpeedFam/IPEC |
676 - ILD |
|
| GFab000886 |
CMP |
SpeedFam/IPEC |
Auriga - ILD |
|
| GFab000887 |
CMP |
SpeedFam/IPEC |
CMP V - ILD |
|
| GFab000988 |
CMP |
SPEEDFAM/IPEC |
AVANTI 372 |
CMP SYSTEM |
| GFab001618 |
Assembly |
SSEC |
2100 |
Computer controlled Parallel Seam Sealer |
| GFab001619 |
Assembly |
SSEC |
2300 |
Precision Parallel Seam Sealer |
| GFab001617 |
Assembly |
SSEC |
2300DLL4 |
Precision Parallel Seam Sealer |
| GFab001774 |
Assembly |
SSEC |
2300e |
Parallel Seam Sealer with 2300 Mechanism, 60" Glove Box,
2ea Passthru Ovens, Moisture Monitor |
| GFab001775 |
Assembly |
SSEC |
Evergreen Model 50 |
Wafer/Plate Cleaner with Automatic Loading, High Pressure and
Brush Scrubbing |
| GFab001808 |
Etch |
SST |
EKC |
Metal Etch wet Sink |
| GFab001871 |
Test |
ST5020 |
Credence |
|
| GFab001776 |
Other |
STAUBLI SA |
Puma 200 |
Robot, 2ea Available |
| GFab001353 |
Etch |
Steag |
AWP |
|
| GFab001257 |
Wet |
Steag Microtech |
Marangoni Dryer |
| GFab001856 |
Etch |
STI |
LAM |
|
| GFab000836 |
CMP |
Strasbaugh |
6DS-SP |
Rotational CMP Platforms |
| GFab000837 |
CMP |
Strasbaugh |
6EC |
Rotational CMP Platforms |
| GFab000989 |
CMP |
Strasbaugh |
6DS-SP |
Some parts
missing integrated Ontrack post CMP
cleaner |
| GFab001135 |
Miscellaneous |
StrataSys Inc |
FDM 2000CAD |
|
| GFab001779 |
Etch |
STS |
320PC |
Reactive Ion Etch
System |
| GFab001573 |
Etch |
STS |
Multiplex |
RIE system |
| GFab001780 |
Etch |
STS |
Multiplex |
CVD Deposition for 100mm-200mm Wafers |
| GFab001453 |
Wet |
STS |
Wet Process |
Wet Process |
| GFab001874 |
Test |
STS5000 |
Credence |
tester/SPARC 20 CPU/32 signal pins RF mix cards 2 |
| GFab000945 |
Etch |
Sumitomo |
NKN 202 383A OSC |
Hybrid etcher |
| GFab001819 |
Photo |
SVG |
8120 |
Coater, Bake |
| GFab001820 |
Photo |
SVG |
8120 |
Developer, Bake |
| GFab001627 |
Photo |
SVG |
90S |
Coater, Developer, excellent condition, 200mm |
| GFab001258 |
Diffusion |
SVG |
VTR-7000+ |
Vertical Furnace |
| GFab001259 |
Diffusion |
SVG Thermco |
VTR 7000 |
Vertical Furnace |
| GFab001260 |
Diffusion |
SVG Thermco |
VTR 7001 |
Vertical Furnace |
| GFab001915 |
Photo |
Taitan |
TAITAN |
STEPPER |
| GFab001781 |
Test |
TAKATORI |
ATM-1100C |
Wafer Taping Machine for up to 200mm Wafers |
| GFab001354 |
Other |
Takatori |
ATRM-2100 |
|
| GFab001396 |
Assembly |
Takitori |
ATM 1100C |
|
| GFab001782 |
Test |
TAMARACK |
PRX 500/1000 |
UV Exposure System |
| GFab001136 |
Subsystem |
Technics |
500-II |
Plasma SystemChamber 9"W x 6"H x 8"D |
| GFab001979 |
Test |
Technos |
TREX-610 |
X-ray Analizer |
| GFab001137 |
Metrology |
Technos |
TREX 610S TXRF |
TXRF Series X-Ray Wafer AnalyzerWafer Diameter: 100 mm to 200
mm |
| GFab001783 |
Etch |
TEGAL |
411 |
Plasma Barrel Stripper |
| GFab001579 |
Etch |
Tegal |
801 |
Inline Plasma etcher |
| GFab001580 |
Etch |
Tegal |
803 |
Inline Plasma etcher |
| GFab001784 |
Etch |
TEGAL |
1511 |
Plasma Etcher, Parts Only |
| GFab001575 |
Photo |
Tegal |
900E |
Cass to Cass Wafer Photoresist stripper |
| GFab001576 |
Etch |
Tegal |
900E |
Cass to Cass Strip backside etch |
| GFab001577 |
Etch |
Tegal |
901E |
Cass to Cass Polysilicon/Silicon Nitride Plasma Etcher |
| GFab001578 |
Etch |
Tegal |
903E |
Cass to Cass
Single Wafer Plasma Etcher |
| GFab001138 |
Etch |
Tegal |
803 |
Inline Automatic Plasma Etcher3" to 5" Wafer
Capacity. |
| GFab001139 |
Etch |
Tegal |
903E |
Plasma Etch System3" to 6" Wafer Capacity |
| GFab001785 |
Etch |
TEGAL |
903e |
Plasma Metal Etch System |
| GFab001965 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001968 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001969 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001970 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001971 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001972 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001973 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001974 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001975 |
Test |
TEL |
19S |
Wafer Prober |
| GFab001140 |
Etch |
TEL |
580LC |
Etch system Cassette to Cassette Handling 2" to 6"
Wafer Capacity. |
| GFab001801 |
CVD |
TEL |
615 VDF |
Furnace, Wet Oxide |
| GFab001355 |
Diffusion |
TEL |
ACT 8 SOD |
|
| GFab001263 |
Photo |
TEL |
ACT-8 |
Dual block coat and develop track system |
| GFab001264 |
Photo |
TEL |
ACT-8 |
Dual block coat and develop track system |
| GFab000975 |
Diffusion |
TEL |
Alph 805 |
Furnace |
| GFab000976 |
Diffusion |
TEL |
Alph 805 |
Furnace |
| GFab000977 |
Diffusion |
TEL |
Alph 805 |
Furnace |
| GFab000978 |
Diffusion |
TEL |
Alph 805 |
Furnace |
| GFab000979 |
Diffusion |
TEL |
Alph 805 |
Furnace |
| GFab000958 |
Diffusion |
TEL |
Alpha 605 |
LPCVD Furnace |
| GFab000953 |
Diffusion |
TEL |
Alpha 803 |
LPCVD Furnace |
| GFab000954 |
Diffusion |
TEL |
Alpha 803 |
LPCVD Furnace |
| GFab000955 |
Diffusion |
TEL |
Alpha 803 |
LPCVD Furnace |
| GFab000956 |
Diffusion |
TEL |
Alpha 803 |
LPCVD Furnace |
| GFab000957 |
Diffusion |
TEL |
Alpha 803 |
LPCVD Furnace |
| GFab000963 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000964 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000965 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000966 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000967 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000968 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000969 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000970 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000971 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000972 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000973 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000974 |
Diffusion |
TEL |
Alpha 803 |
Furnace |
| GFab000952 |
Diffusion |
TEL |
Alpha 808 |
LPCVD Furnace |
| GFab000888 |
CVD |
TEL |
Alpha 8S - Anneal |
| GFab000889 |
CVD |
TEL |
Alpha 8S - Nitride |
| GFab000892 |
CVD |
TEL |
Alpha 8S - Oxide |
|
| GFab000893 |
CVD |
TEL |
Alpha 8S - Poly |
|
| GFab001356 |
Diffusion |
TEL |
Alpha 8SE - Other |
| GFab001357 |
Diffusion |
TEL |
Alpha 8SE - Other |
| GFab001358 |
Diffusion |
TEL |
Alpha 8SE - Other |
| GFab001359 |
Diffusion |
TEL |
Alpha 8SE - Other |
| GFab000911 |
CVD |
TEL |
Alpha8SE |
|
| GFab001786 |
CVD |
TEL |
Alpha-8SE-E |
Small Footprint Oxidation Furnace for up to 200mm Wafers |
| GFab000895 |
Photo |
TEL |
Clean Track Act 8 |
| GFab000982 |
Diffusion |
TEL |
GX-2104 |
Furnace |
| GFab000960 |
Diffusion |
TEL |
IW-6C |
LPCVD Furnace |
| GFab000961 |
Diffusion |
TEL |
IW-6C |
LPCVD Furnace |
| GFab000962 |
Diffusion |
TEL |
IW-6C |
LPCVD Furnace |
| GFab001539 |
Photo |
TEL |
Mark II |
150mm, Developer |
| GFab001540 |
Photo |
TEL |
Mark II |
150mm, developer |
| GFab001262 |
Photo |
TEL |
Mark-8 |
SOD Track System |
| GFab001950 |
CVD |
TEL |
MB2-730 |
Wsi CVD |
| GFab001503 |
Assembly |
TEL |
P8 |
Prober with hot chuck |
| GFab001504 |
Assembly |
TEL |
P8 |
Prober with hot chuck |
| GFab001787 |
CVD |
TEL |
SCCM |
Chamber Only for TEL Unity M Etch Tool - Excellent Condition |
| GFab000942 |
Etch |
TEL |
TE 8500 ATC |
Oxide Etcher ATC chamber |
| GFab000980 |
Diffusion |
TEL |
UL 2604 08L |
Furnace |
| GFab000941 |
Etch |
TEL |
Unity II 88 |
Etcher |
| GFab000940 |
Etch |
TEL |
Unity Iie 88 DD |
Oxide Etcher SSCM |
| GFab001360 |
Etch |
TEL |
Unity SP |
|
| GFab000959 |
Diffusion |
TEL |
VCF615 |
LPCVD Furnace |
| GFab001935 |
Diffusion |
TEL |
α-8S-ZABF |
DIFFUSION FURNACE |
| GFab001963 |
PVD |
TEL・Varian |
MB2-830 |
Sputter |
| GFab001964 |
PVD |
TEL・Varian |
MB2-830 |
Sputter |
| GFab001788 |
Test |
TELEDYNE |
TAC PR-53 |
Wafer Prober |
| GFab001552 |
PVD |
Temescal |
BJD-1800 |
Electron Beam Evaporator |
| GFab001553 |
PVD |
Temescal |
FC-1800 |
Load Locked E-Beam
Evaporator, one refurbished |
| GFab001789 |
PVD |
TEMESCAL |
FC-1800 |
E-Beam Evaporator, with CV-14 P/S, 4 Pocket E-Gun, Substrate
Heat, more |
| GFab001554 |
PVD |
Temescal |
FC-4800 |
|
| GFab001790 |
PVD |
TEMESCAL |
FCE-4000 |
E-Beam Evaporator, with 3' X 3' X 3' Chamber, CV-14 P/S, 4
Pocket E-Gun, Ion Tech Ion Gun, PLC Controller, Inficon IC5 Deposition
Controller, Substrate Heat, MFC Gas System |
| GFab001791 |
Test |
TENCOR |
AlphaStep 200 |
Profilometer |
| GFab001792 |
Test |
TENCOR |
AlphaStep 200 |
Profilometer |
| GFab001513 |
Test |
TENCOR |
ALPHA-STEP 200 |
| GFab001530 |
Test |
TENCOR |
Alpha-step P1 |
|
| GFab001308 |
Metrology |
Tencor |
FT600 |
Prometrix FT-600 |
| GFab001141 |
Metrology |
Tencor |
P-10 |
Surface Profiler Sample Size: up to 200 mm |
| GFab001538 |
Test |
TENCOR |
SFS 6220 |
1996, 200mm |
| GFab001793 |
Test |
TENCOR |
Surfscan 4000 |
Unpatterned Wafer Surface Inspection Tool - Parts Tool Only |
| GFab001794 |
Test |
TENCOR |
Surfscan 4500 |
Unpatterned Wafer Surface Inspection Tool |
| GFab001887 |
Test |
Tencor |
HRP 100 |
High Resolution Profiler |
| GFab001888 |
Test |
Tencor |
P12 |
Profiler |
| GFab001265 |
Photo |
Tepla |
Auto 300 |
Asher |
| GFab001885 |
Test |
Teradyne |
5539Ci |
AOI, Advanced Optical Inspection Panel Tester |
| GFab001626 |
Test |
Teradyne |
J973ST |
Structural Test |
| GFab001361 |
Assembly and Test |
Teradyne |
J994W |
|
| GFab001362 |
Assembly and Test |
Teradyne |
J994W |
|
| GFab001870 |
Assembly |
Tesam |
8653DC |
Handlers |
| GFab001266 |
Metrology |
Thermawave |
5240 |
Film Thickness Measurement Tool |
| GFab001267 |
Metrology |
Thermawave |
Optiprobe 2600 |
Film Thickness Measurement Tool |
| GFab001423 |
Metrology |
Thermawave |
Optiprobe 2600B |
|
| GFab001309 |
Metrology |
ThermaWave |
TM320 |
Therma-Wave ThermaProbe TP320 |
| GFab001142 |
Diffusion |
Thermco |
MB-71 |
Laboratory Diffusion Furnace Operating Temperature 200c to
1200c |
| GFab001381 |
Other |
Thermo Electron |
ECO 8 |
|
| GFab002007 |
Assembly |
TOKYO SEIMITSU |
A-FP-210A |
CMP |
| GFab001966 |
Test |
Tokyo Seimitsu |
A-PM-90A |
Wafer Prober |
| GFab001967 |
Test |
Tokyo Seimitsu |
A-PM-90A |
Wafer Prober |
| GFab002006 |
Test |
Topcon |
WM-1700 |
Particle Measurement System |
| GFab001797 |
Wet |
TRION |
Minilock |
Single Wafer RIE Etcher with Loadlock, 200mm Wafers |
| GFab001798 |
Test |
TSK |
APM-90A |
Automatic Wafer Prober, for up to 200mm Wafers |
| GFab001799 |
Test |
TSK |
UF-200AL |
Automatic Wafer Prober, for up to 200mm Wafers |
| GFab001877 |
Assembly |
UF200 |
TSK |
|
| GFab001609 |
Test |
Ultrapointe |
1010 |
Laser Imagin system |
| GFab000935 |
Photo |
Ultratech |
1100 |
1:1 projection stepper |
| GFab000934 |
Photo |
Ultratech |
22441 |
I line stepper |
| GFab001268 |
Photo |
Ultratech |
4700 2244i Titan |
Wafer Stepper |
| GFab001269 |
Photo |
Ultratech |
6700 Saturn |
Wafer Stepper |
| GFab001143 |
Mask |
Ultratech |
602 |
Mask Cleaner Handles up to 7" x 7" Mask |
| GFab001144 |
Photo |
Ulvac |
UNA-2000 |
Ashing System3" to 6" Wafer Capacity. |
| GFab001550 |
PVD |
Unaxis |
BAK 1131 |
Large Box Coater Evaporation System |
| GFab001548 |
PVD |
Unaxis |
BAK EVO |
2001, Thermal Evaporator |
| GFab001311 |
Spares |
Unit |
See Listing |
Unit Mass Flow Controllers |
| GFab001368 |
Implant |
Unltratech |
MLA |
|
| GFab000939 |
Photo |
Ushio |
TUV 604 |
UV Bake |
| GFab001906 |
Photo |
USHIO |
UX-4040SC-CA01 |
Mask Aligner |
| GFab001534 |
Photo |
USHIO |
Wee |
|
| GFab001544 |
Photo |
USHIO |
WEE, FX 500sk |
|
| GFab001806 |
Etch |
UT1000 |
TEL |
Metal Etcher |
| GFab001873 |
Test |
V2 |
KVD |
Mixed signal, tester/DC source16 I/O channels/test head
support up to 16 channels per card/80 I/o channels/Waveform source and
measure |
| GFab001086 |
Etch |
Vacuum Tech |
Dry |
etch processing systems |
| GFab001960 |
PVD |
Varian |
3280 |
Sputter |
| GFab001902 |
|
Varian |
E220 |
|
| GFab001145 |
Subsystem |
Varian |
VFW287081 |
|
| GFab001146 |
Assembly |
VCR Group |
D500i |
Wafer Dicing Table Saw |
| GFab001363 |
Test |
Veeco |
Dektak V320-SL |
|
| GFab001981 |
Test |
VEECO |
DEKTAKSXM |
Inspection |
| GFab001893 |
Test |
VEECO |
SXM |
Atomic Force Profiler |
| GFab001402 |
Assembly |
Versatest |
V1004 |
|
| GFab001403 |
Assembly |
Versatest |
V1004 |
|
| GFab001270 |
Wet |
Verteq |
1600 |
Dual Stack SRD |
| GFab001147 |
Wet |
Verteq |
1600 SRD |
Double StackCapable of 4" to 6" Wafers |
| GFab001518 |
Wet |
VERTEQ |
SPIN Dryer 1800-50B |
| GFab001148 |
Wet |
Verteq |
1600 SRD |
Single Stack Capable of
4" to 6" Wafers |
| GFab001271 |
CVD |
Watkins Johnson |
1000T |
APCVD Furnace |
| GFab000948 |
CVD |
Watkins Johnson |
WJ1000 |
APCVD Tool |
| GFab000949 |
CVD |
Watkins Johnson |
WJ1000 |
APCVD Tool |
| GFab000947 |
CVD |
Watkins Johnson |
WJ999 |
APCVD Tool |
| GFab000946 |
CVD |
Watkins Johnson |
WJ-999R |
APCVD Tool |
| GFab001149 |
Subsystem |
Waypoint Technology Inc |
|
| GFab000906 |
Assembly |
WED |
8602 |
|
| GFab001150 |
Subsystem |
WED |
Loader AUL |
AutoloaderCapable of 4" to 6" Wafers |
| GFab001151 |
Metrology |
WED |
MarcoSpec UV Inspection |
Inspection SystemCapable of 4" to 6" Wafers |
| GFab001152 |
Metrology |
WED |
Micro Loaders |
Inspection SystemCapable of 4" to 6" Wafers |
| GFab001980 |
Test |
WINTEST |
103C |
Digital Tester |
| GFab001867 |
CVD |
WJ1000TEOS |
Watkins Johnson |
| GFab001868 |
CVD |
WJ1500 |
Watkins Johnson |
APCVD |
| GFab001585 |
Test |
Wyko |
BOP2000W |
Bump Measurement Profiling system |
| GFab001857 |
Implant |
XR80 |
APPLIED MATERIALS |
Implanter |
| GFab001154 |
Clean |
Yield YES |
R-3 |
Plasma Cleaning System Chamber size: 16" W x 12" D x
7" H |
| GFab001153 |
Oven |
Yield YES |
LPIII-M3 |
Vapor Prime OvenChamber 12"x12"x13.25" |
| GFab000885 |
Test |
Zeiss |
Axiotron |
|
| GFab001155 |
Metrology |
Zeiss |
IM-12 |
Wafer LoaderCapable of 4" to 6" Wafers |
| GFab001156 |
Metrology |
Zygo |
8100 |
Wavefront Analyzer Capable 3" to 8" wafers |
| GFab001978 |
Test |
|
JED-2001 |
X-ray Analizer |
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