| GFAB Ref |
Category |
OEM |
Model |
Tool/Description |
| GFab001429 |
Photo |
Accent |
Q7 |
|
| GFab001019 |
Metrology |
ADE |
6034 |
Wafer Measurement |
| GFab001636 |
Test |
ADE |
9350 |
Wafer Test System, 200mm Wafers |
| GFab001637 |
Test |
ADE |
3046A |
Wafer Thickness, Taper & Bow Tester |
| GFab001608 |
Test |
ADE |
7900 Ultra Gage |
Multifunction Dimensional Measurements for 500nm design rule |
| GFab001638 |
Test |
ADE |
8100-14 |
Wafer Tester with Wafer Shape, High Resistivity and Type
Testing |
| GFab001531 |
Test |
ADE |
ADE 9700 |
|
| GFab001020 |
Metrology |
ADE |
EpiScan 1000 |
High-speed film thickness measurement and mapping tool |
| GFab001021 |
Metrology |
ADE |
Ultra Gage 9500 |
|
| GFab001886 |
Test |
ADE 9500 Ultragage |
Ultragage 9500 |
|
| GFab001372 |
Metrology |
ADEC |
ADE 9500 |
|
| GFab001272 |
Test |
ADEC |
BT1152-240 |
ADEC 1152 Board Tester |
| GFab001210 |
Metrology |
ADE-DMS |
780 MRT |
Digital Measurement System |
| GFab001442 |
Test |
Advantest |
M6761A |
Retho Test ATE |
| GFab001447 |
Test |
Advantest |
M6761AD |
Retho Test ATE |
| GFab002000 |
Test |
Advantest |
T3324 |
Memory Tester |
| GFab002001 |
Test |
Advantest |
T5363P |
Memory Tester |
| GFab002002 |
Test |
Advantest |
T5363P |
Memory Tester |
| GFab001443 |
Test |
Advantest |
T5365P |
Memory Test in Device |
| GFab001444 |
Test |
Advantest |
T5365P |
Memory Test in Device |
| GFab001445 |
Test |
Advantest |
T5365P |
Memory Test in Device |
| GFab001486 |
Assembly |
Advantest |
T5382A |
Memory Tester (Dual head with MRAA) |
| GFab001487 |
Assembly |
Advantest |
T5382A |
Memory Tester (Single head#1) |
| GFab001884 |
Test |
Advantest |
T666AF |
ESD Tester |
| GFab001446 |
Test |
Advantest |
T6673 |
Digital Test Systems in Device |
| GFab001382 |
Assembly |
Advantest |
TR1000T |
|
| GFab001488 |
Assembly |
Advantest |
T5382A |
Memory Tester (Single head#2) |
| GFab001485 |
Assembly |
Advantest |
T5382A |
Memory Tester (Dual head) |
| GFab001489 |
Assembly |
Advantest |
T5581P |
Memory Tester (Single head) |
| GFab001448 |
Test |
Aehr |
MTX 3000 H/A |
|
| GFab001641 |
Test |
AERONCA |
WIS-100 |
Wafer Surface Inspection System |
| GFab001642 |
Test |
AERONCA |
WIS-900 |
Wafer Surface Inspection System, 2ea Available |
| GFab001643 |
CVD |
AG ASSOCIATES |
2106 |
Rapid Thermal Processing System, for 100mm-150mm Wafers |
| GFab001644 |
CVD |
AG ASSOCIATES |
2146 |
Rapid Thermal Processing System, Parts Tool Only |
| GFab001023 |
CVD |
AG Associates |
610 Heatpulse |
RTA Rapid Thermal Annealing |
| GFab001022 |
CVD |
AG Associates |
4100 Heatpulse |
RTA Rapid Thermal Annealing |
| GFab001025 |
CVD |
AG Associates |
Heatpulse 410 |
RTA Rapid Thermal Annealing |
| GFab001982 |
Test |
AGIDENT |
16442A |
Parameter Analyzer Tool |
| GFab001404 |
Test |
Agilent |
1100 |
|
| GFab001312 |
Other |
Agilent Technologies |
V4400 |
|
| GFab001313 |
Other |
Agilent Technologies |
V4400 |
|
| GFab001273 |
Subsystem |
Air Liquide |
See Listing |
Gas VMBs |
| GFab001449 |
Test |
Aixacct |
TF Analyzer 2000 |
| GFab001581 |
CVD |
Aixtron |
AIX200 |
LP-MOCVD Chemical Vapor Deposition |
| GFab001645 |
Wet |
AKRION |
V2-HL.2000 |
Hybrid-Linear Automatic Acid Wet Station with Robotic Transfer
(New), for Dual 150mm Cassettes |
| GFab001646 |
Wet |
AKRION |
V2-SA.3200 |
Semi-Automatic Acid Wet Station w/Robotic Transfer, 7 Tanks
for Dual 150mm Cassettes |
| GFab001647 |
Wet |
AKRION |
V2-SA.3200 |
Semi-Automatic S/S Solvent Wet Station (New) |
| GFab001568 |
PVD |
Alcatel |
2441C |
RF Sputter UP system |
| GFab001648 |
Test |
ALESSI |
REL-4500 |
Analytical Manual Wafer Prober - Parts Tool Only |
| GFab001490 |
Assembly |
Alpha Innotech |
FA-1000 |
Photo Emission Microscopy System |
| GFab001472 |
Assembly |
Alphasem |
SL9002-MM |
Flip Chip bonder |
| GFab001649 |
Test |
ALPHASEM |
Swissline 9006 |
Automatic Epoxy Die Bonder, 2ea Available |
| GFab002009 |
Others |
AMAT |
8" Susceptor |
Calibration Leveling tool |
| GFab001507 |
Etch |
AMAT |
AME8330 |
|
| GFab001516 |
Etch |
AMAT |
AME8330 |
|
| GFab001547 |
CVD |
AMAT |
Centura 5200 CVD |
1999, SACVD |
| GFab001528 |
CVD |
AMAT |
Centura 5200 RTP |
200mm |
| GFab001529 |
CVD |
AMAT |
Centura 5200 RTP |
200mm |
| GFab001537 |
CVD |
AMAT |
Centura 5200 RTP |
2000, 200mm |
| GFab001523 |
CVD |
AMAT |
Centura 5300 |
200mm |
| GFab001510 |
Etch |
AMAT |
Centura DPS+ |
1999, 200mm |
| GFab001931 |
Etch |
AMAT |
Centura eMAX |
Oxide Etch |
| GFab001520 |
Etch |
AMAT |
CENTURA II DPS+ |
2002, 200mm |
| GFab001545 |
Etch |
AMAT |
Centura II Super E |
2000, Oxide Etch |
| GFab001546 |
Etch |
AMAT |
Centura II Super E |
2000, Oxide Etch |
| GFab001920 |
Etch |
AMAT |
Centura MXP |
Poly Etch |
| GFab001525 |
Etch |
AMAT |
E-Max Chamber Assy |
200mm |
| GFab001525A |
Etch |
AMAT |
E-Max Chamber Assy |
200mm |
| GFab001526 |
Etch |
AMAT |
E-Max Chamber Assy |
200mm |
| GFab002011 |
Etch |
AMAT |
P5000 |
MxP+ Etch |
| GFab002012 |
Etch |
AMAT |
P5000 |
TEOS |
| GFab001919 |
Etch |
AMAT |
P-5000 |
Poly Etch |
| GFab001953 |
CVD |
AMAT |
P-5000 |
TiN CVD |
| GFab001954 |
CVD |
AMAT |
P-5000 |
CVD |
| GFab001511 |
Etch |
AMAT |
P-5000 |
1995.10, 200mm |
| GFab001519 |
Etch |
AMAT |
P-5000 |
1994, 200mm |
| GFab001521 |
Etch |
AMAT |
P5000 ETCH |
200mm |
| GFab001522 |
Etch |
AMAT |
P5000 ETCH |
200mm |
| GFab001524 |
Etch |
AMAT |
P5000 ETCH |
200mm |
| GFab001952 |
CVD |
AMAT |
P5000 MK-II |
TEOS CVD |
| GFab001951 |
CVD |
AMAT |
P5000C |
SIN CVD |
| GFab001955 |
CVD |
AMAT |
P5000Wxz |
W-CVD |
| GFab001927 |
Etch |
AMAT |
PE8330 |
METAL Etch |
| GFab001928 |
Etch |
AMAT |
PE8330 |
METAL Etch |
| GFab001929 |
Etch |
AMAT |
PE8330 |
METAL Etch |
| GFab001937 |
Implant |
AMAT |
PI9500 |
High Current Implanter |
| GFab001938 |
Implant |
AMAT |
PI9500 |
High Current Implanter |
| GFab001939 |
Implant |
AMAT |
PI9500 |
High Current Implanter |
| GFab001026 |
Metrology |
AMEL Instruments |
Instruments Model 2049 |
| GFab001027 |
Metrology |
AMEL Instruments |
Instruments Model 2053 |
| GFab001274 |
Test |
Amtech/Tempress |
|
Amtech/Tempress Atmoscan System (New in crate) |
| GFab001028 |
PVD |
Anatech Hummer |
6.2 |
|
| GFab001961 |
PVD |
Anelva |
I-1060 SVII Plus-1 |
Co-Sputter |
| GFab001962 |
PVD |
Anelva |
I-1060SV II |
Alminium Sputter |
| GFab001959 |
PVD |
Anelva |
ILC-1060SV |
Sputter |
| GFab000951 |
CVD |
APEX |
F636A-01 (Cruise 2000) |
MOCVD LCSVD |
| GFab001899 |
Test |
Applied Material Orbot
WF736 $65K |
Tester |
| GFab000944 |
Etch |
Applied Materials |
5300 |
Etcher |
| GFab001650 |
Etch |
APPLIED MATERIALS |
8330 |
Hexode Plasma Etchers for 125mm Wafers |
| GFab001628 |
Etch |
Applied Materials |
8330 |
Metal Etcher |
| GFab000908 |
Implant |
Applied Materials |
9200 |
|
| GFab000909 |
Implant |
Applied Materials |
9500 |
|
| GFab001438 |
CVD |
Applied Materials |
5200 Centura |
|
| GFab001450 |
Etch |
Applied Materials |
8300A-0020 |
Oxide Etcher |
| GFab001426 |
CVD |
Applied Materials |
AMAT 5200 CENTURA |
| GFab001417 |
CVD |
Applied Materials |
AMAT P5000 |
CVD |
| GFab001425 |
CVD |
Applied Materials |
AMAT P5000 |
|
| GFab001365 |
Thin Films |
Applied Materials |
AMAT ULTIMA X 300MM |
HDPCVD |
| GFab001314 |
Thin Films |
Applied Materials |
Centura 5200 DPN |
| GFab001315 |
Thin Films |
Applied Materials |
Centura 5200 DPN |
| GFab001316 |
Thin Films |
Applied Materials |
Centura 5200 Metal Etch
MxP |
| GFab000852 |
Etch |
Applied Materials |
Centura 5200 Oxide Etch
MxP+ |
| GFab000910 |
CVD |
Applied Materials |
Centura RTP XE+/Wsix |
| GFab001317 |
Thin Films |
Applied Materials |
Centura SACVD |
|
| GFab001439 |
Other |
Applied Materials |
Compass |
|
| GFab001651 |
Test |
APPLIED MATERIALS |
DR SemVision |
SEM Based Defect Review System |
| GFab001607 |
Test |
Applied Materials |
Excite |
High Speed Particle Detection |
| GFab001451 |
Test |
Applied Materials |
Excite IPM |
Unpatterned Wafer Inspection |
| GFab001582 |
CVD |
Applied Materials |
HDPEtch Chamber |
| GFab001318 |
Other |
Applied Materials |
IPM 832 |
|
| GFab001411 |
CVD |
Applied Materials |
P5000 |
CVD |
| GFab001319 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001320 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001321 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001322 |
Etch |
Applied Materials |
P5000 Mark II Metal |
| GFab001323 |
CVD |
Applied Materials |
Reflexion - ILD |
|
| GFab001652 |
CVD |
APPLIED MATERIALS |
Type 3 |
On Board TEOS Hot Box, 6 Channels |
| GFab001202 |
CVD |
Applied Materials |
5000 |
3 Ch SACVD System, refurbished |
| GFab001203 |
CVD |
Applied Materials |
5000 |
3 Ch Silane PECVD system, refurbished |
| GFab001204 |
Etch |
Applied Materials |
Centura 5200 |
2 Ch DPS R1 poly etch system, refurbished |
| GFab001205 |
Etch |
Applied Materials |
Centura 5200 |
3 Ch eMxP+ oxide etch system, refurbished |
| GFab001206 |
CVD |
Applied Materials |
Centura 5200 |
4 Ch DXZ PECVD System, refurbished |
| GFab001207 |
CVD |
Applied Materials |
Centura 5200 |
4 Ch DXZ SACVD System, refurbished |
| GFab001208 |
ALD |
Applied Materials |
Centura 5200 |
Ald Centura System |
| GFab001211 |
CVD |
Applied Materials |
Centura 5200 |
MxP Etch system - Oxide 200mm |
| GFab001213 |
Metrology |
Applied Materials |
Opal 7830i |
CD SEM |
| GFab001212 |
Metrology |
Applied Materials |
SEM VISION CX |
SEM |
| GFab001653 |
Etch |
APT |
3145 |
Metal Etch Tools with Robotic Handling, for 75mm to 200mm
Wafers, 2ea Available |
| GFab001275 |
Subsystem |
Arch |
Genstream |
Arch Teos Delivery System (New) |
| GFab001452 |
Diffusion |
ASM |
Polygon Platform |
Thin Film |
| GFab001654 |
Photo |
ASML |
2500/40 |
i-Line Wafer Stepper |
| Gfab002010 |
Photo |
ASML |
PAS 5000 / 45 |
STEPPER |
| GFab001432 |
Photo |
ASML/SVG US INC |
MSII+ |
Track |
| GFab001430 |
Photo |
ASML/SVG US INC |
SERIES 90-S |
Track |
| GFab001431 |
Photo |
ASML/SVG US INC |
SERIES 90-S |
Track |
| GFab001622 |
Other |
Asyst |
SMIF 300 WMS |
Wafer Management system |
| GFab001029 |
Wet |
Atcor |
CRD-2410 |
Box Washer |
| GFab001383 |
Assembly |
Avsi |
AVSI 480BT |
|
| GFab001398 |
Photo |
Axcelis |
200 PCU |
|
| GFab001214 |
Photo |
Axcelis |
200PCU |
Photostabilizer |
| GFab001215 |
Photo |
Axcelis |
AC2 |
Ozone Asher |
| GFab001441 |
Implant |
Axcelis |
HC3 Ultra 5.5 |
Ion Implanter- 300mm-13 wafer batch- 4 PDOs- full 300mm
factory automation-exc condition |
| GFab000937 |
Photo |
Axcelis / Fusion |
200 ACU |
Ashing System |
| GFab000938 |
Photo |
Axcelis / Fusion |
M 200 PC |
UV Cure System |
| GFab001549 |
PVD |
Balzers |
BAK 760 |
High Capacity High Vacuum Evaporation System |
| GFab001030 |
Subsystem |
Bay Voltex HS 0550-AC-SX-ENL |
HS 0550-AC-SX-ENL |
| GFab001031 |
Subsystem |
Bay Voltex LT-1650-WC-DI-AM Chiller |
LT-1650-WC-DI-AM Chiller |
| GFab001621 |
Assembly |
Benchmark Gen II |
SM-8000 |
Parallel Seam Sealer |
| GFab001532 |
Test |
Biorad |
Bio-RAD |
Overlay and CD Measurement System |
| GFab001533 |
Test |
Biorad |
Bio-RAD |
Overlay and CD Measurement System |
| GFab001655 |
Test |
BIORAD |
Q6 |
Overlay Metrology Tool |
| GFab001656 |
Test |
BIORAD |
Q7/Q8 |
Overlay Metrology Tool for up to 200mm Wafers, 3ea Available |
| GFab001657 |
Test |
BIORAD |
QS-300 |
FTIR Epi Thickness Monitor for up to 150mm Wafers |
| GFab001658 |
Test |
BIORAD |
QS-300 |
FTIR Epi Thickness Monitor for up to 200mm Wafers |
| GFab001659 |
Test |
BIORAD |
QS-500 |
FTIR Epi Thickness Monitor for up to 200mm Wafers |
| GFab001384 |
Assembly |
Blue M |
DCC-256F |
Oven |
| GFab001276 |
Other |
Blue M |
IGF-6680F-4 |
Blue M Ultra Temp Oven |
| GFab001032 |
Subsystem |
Blue M |
DCC 256C |
Cleanroom Oven |
| GFab001033 |
Subsystem |
Blue M |
Model CW-190G-MP2 |
High Temp Oven |
| GFab001034 |
Subsystem |
Blue M |
Model DCC-146C |
| GFab001277 |
Subsystem |
Bold |
PT1180, PT1184 |
Bold Recirculators |
| GFab001035 |
Etch |
Branson |
IPC 4000 |
Barrel Asher |
|
|
|
|
|
| GFab001434 |
CMP |
Brooks |
8100 |
|
| GFab001278 |
Spares |
Brooks |
various |
Brooks Mass Flow Controllers |
| GFab001037 |
Subsystem |
Buehler |
Budzar Ice Chiller |
Chiller |
| GFab001219 |
Photo |
Cannon |
FPA-3000-i4 |
Wafer Stepper |
| GFab001220 |
Photo |
Cannon |
FPA-3000-i4 |
Wafer Stepper |
| GFab001221 |
Photo |
Cannon |
FPA-3000-i4 |
Wafer Stepper |
| GFab001218 |
Photo |
Cannon |
FPA-3000-i5 |
Wafer Stepper |
| GFab001216 |
Photo |
Cannon |
FPA-3000-iW |
Wafer Stepper |
| GFab001217 |
Photo |
Cannon |
FPA-3000-iW |
Wafer Stepper |
| GFab001814 |
Photo |
Canon |
1550 |
Mark V steppers, G line |
| GFab001512 |
Photo |
Canon |
Aligner(PLA-501FA) |
| GFab001957 |
CVD |
CANON |
APT5850 |
TEOS-3 CVD |
| GFab000933 |
Photo |
Canon |
FPA 1550 |
g line stepper |
| GFab000932 |
Photo |
Canon |
FPA1550M3W |
g line stepper |
| GFab001922 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001923 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001924 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001925 |
Etch |
CANON |
MAS8000 |
Asher |
| GFab001926 |
Etch |
CANON |
MAS-8000 |
Asher |
| GFab001933 |
Etch |
CANON |
MAS-801 |
Asher |
| GFab001038 |
Photo |
Canon |
MPA 500 |
Projection Mask Aligner |
| GFab001039 |
Photo |
Canon |
PLA 501F |
Parallel Light Mask Aligner Cassette to cassette Mask aligner
for 2"-5" wafer |
| GFab001909 |
Photo |
CANON |
PLA501FA |
Mask Aligner |
| GFab001040 |
Photo |
Canon |
PLA 501F |
Parallel Light Mask Aligner Cassette to cassette Mask aligner
for 2"-6" wafer |
| GFab001459 |
Metrology |
Carl Zeiss |
MSM100 / AIMS |
| GFab001660 |
Test |
CDE |
ResMap 378 |
Resistivity Mapping Tool, for up to 300mm Wafers |
| GFab000838 |
Test |
CDE |
ResMap168 |
Automated four point probe for resistivity and metal thickness
mapping |
| GFab001557 |
PVD |
CHA |
MPS 4 |
Multiposition Horizontal Sputtering system |
| GFab001558 |
PVD |
CHA |
SSB 600 |
Single Target DC Magnetron Sputting system |
| GFab001892 |
Test |
Chapman |
MP 2000 Plus |
Laser Profiler |
| GFab001661 |
Test |
CR TECHNOLOGY |
CRX-1000 |
Real Time Xray Imaging System |
| GFab001332 |
Test |
Creative Design Engineering (CDE) |
ResMap 463 |
|
| GFab001331 |
Test |
Creative Design Engineering
(CDE) |
ResMap 463 |
|
| GFab001633 |
Assembly |
Credence |
212 |
Parts Machine Only |
| GFab001367 |
Metrology |
Credence |
IDS2000 |
Tester |
| GFab001460 |
Test |
Credence |
Kalos PK1 |
Automated Test Prober for Flash Memory |
| GFab001635 |
Test |
Credence |
Personal Kalos |
|
| GFab001041 |
PVD |
CVC |
611 |
Loadlock Deposition System Sputter Capability up to 6" |
| GFab001995 |
Test |
Daito Shoji |
F-3555 |
RETICLE INSPECTION |
| GFab000839 |
Test |
Dektak |
3 Series |
Surface profilometer and step height measurement |
| GFab001279 |
Other |
Delatech |
858-4 |
Delatech CDO System |
| GFab001389 |
Assembly |
Delta Design |
1020 FLEX HNDLR |
Handler |
| GFab001390 |
Assembly |
Delta Design |
1020 FLEX HNDLR |
Handler |
| GFab001391 |
Assembly |
Delta Design |
1210 FLEX HNDLR |
Handler |
| GFab001662 |
Test |
DELTRONIC |
DV-114 |
Optical Comparator with Digital XY Readout |
| GFab001392 |
Assembly |
Despatch |
CRB |
|
| GFab002008 |
Assembly |
DISCO |
DFD620 |
Dicing Saw |
| GFab001800 |
CVD |
DJ-807 |
Kokusai |
4 Chamber Furnace w/ preclean |
| GFab001812 |
Photo |
DNS |
626 |
Coater, Developer |
| GFab001541 |
Photo |
DNS |
DNS-629 |
PR Coater |
| GFab001542 |
Photo |
DNS |
DNS-629 |
PR Coater |
| GFab001543 |
Photo |
DNS |
DNS-629 |
PR Coater |
| GFab001945 |
Wet |
DNS |
FC-821L |
1 BATH RCA SCRUBBER |
| GFab001333 |
Wet |
DNS |
FC-821L |
|
| GFab001334 |
Wet |
DNS |
FC-821L |
|
| GFab001905 |
Photo |
DNS |
SC-W60A-AVFG |
SOG Coater |
| GFab001910 |
Photo |
DNS |
SCW-80A-AV(Q) |
POLYMID COATER |
| GFab001663 |
Wet |
DNS |
SC-W80A-AVFG |
SOG Furnace with Interface |
| GFab001904 |
Photo |
DNS |
SC-W80A-AVG |
SOG Coater |
| GFab001223 |
Photo |
DNS |
SK200W-RVPE |
Track System |
| GFab001667 |
Wet |
DNS |
SK-W80A-BVP |
Photoresist Coater/Developer, 3 Coat, 2 Develop, 200mm Wafers |
| GFab001222 |
Photo |
DNS |
SK-W80A-BVP |
Track System |
| GFab001668 |
Wet |
DNS |
SKW-80A-BVPE |
Photoresist Coater/Developer, 1 Coat, 2 Develop, WEE for 200mm
Wafers |
| GFab001944 |
Wet |
DNS |
SR-3000 |
Cleaner |
| GFab000853 |
Wet Etch |
DNS |
SS-W80AAR |
|
| GFab001998 |
Test |
DNS |
VM-8200 |
Thickness Measurement |
| GFab001335 |
Wet |
DNS |
VPC |
|
| GFab001669 |
Wet |
DNS |
WS-820C |
Automated Wet Processing System with IPA Vapor Dryer, 200mm Wafers |
| GFab001850 |
Photo |
DNS |
629 |
PR coater |
| GFab001464 |
Photo |
DNS- Dainipponscreen |
DP-636-C |
3 Tracks with each 3 hotplate and 1 coolplate. Each track has
1 carrier send and 1 receive. |
| GFab001894 |
Photo |
DNS |
W80 |
SOG Coater |
| GFab001465 |
Photo |
DNS-Dainipponscreen |
DP-636-C |
1 Coater unit 4 Hotplates 2 Coolplates 4 Carriers 2 coating
systems with pressuredispence from the tank/bottle each is suported with a
traptank. Suitable for any Type of Photoresist. |
| GFab001405 |
Other |
Dryden |
DE3496SPD |
|
| GFab001280 |
Etch |
Drytek |
Megastrip 6 |
Drytek Megastrip 6 |
| GFab001872 |
Test |
Duo |
Credence |
VLSI, Tester 50/100 Mhz Conf. 60Mhz 1digital capture board W/8
pins, 2 abbitary waveform Generator boards for 16 pins AWG. |
| GFab001042 |
Test |
Dupont |
120ssa |
Helium Leak Detector |
| GFab001670 |
Assembly |
DUSAN |
Smart Die |
Trim & Form Press, 5ea Available |
| GFab001671 |
Assembly |
DYNATEX |
DX-III |
Wafer Scriber/Breaker |
| GFab001043 |
Test |
E G & G Instruments |
Model 263A |
|
| GFab001672 |
Test |
EALING INSTRUMENTS |
6' Long |
Optical Bench |
| GFab000983 |
Implant |
Eaton |
H143 (NV-10-80) |
Implant |
| GFab001282 |
Subsystem |
Ebara |
2.1 |
Ebara 2.1 Cryo Compressors |
| GFab001283 |
Subsystem |
Ebara |
4.8 |
Ebara 4.8 Cryo Compressors |
| GFab000831 |
CMP |
Ebara |
EPO |
Ebara Integrated Polish Configurations |
| GFab001467 |
Test |
Edax |
CM200ST Alpha 147-5 |
Failure Analysis |
| GFab001468 |
Test |
Edax |
EDX |
Failure Analysis |
| GFab001369 |
Diffusion |
EEJA |
POSFER |
|
| GFab001631 |
Test |
Electroglas |
4085cx |
Prober with hot chuck |
| GFab001224 |
Metrology |
Electroglas |
4090u |
Prober |
| GFab001878 |
Test |
Electroglas |
5/300e |
Prober, 300mm, hot/cold nickel chuck, -55degC-+200degC, Auto
probe to pad, chiller, manip. |
| GFab001373 |
Test |
Electroglas |
EG 4085 |
Prober |
| GFab001371 |
Test |
Electroglas |
EG 4085X |
Prober |
| GFab001469 |
Test |
Electroglas |
Horizon 4085X |
Automatic Wafer Prober |
| GFab001044 |
Power
Supplies-RF-Plasma-E-Gun |
Electrotech |
LF-24 |
|
| GFab001860 |
Test |
EM-1 |
Prometrix |
|
| GFab001045 |
Subsystem |
ENI |
ACG-10 |
Generator |
| GFab001046 |
Subsystem |
ENI |
HF-1 |
Generator |
| GFab001869 |
Test |
EPRO |
142AX |
Memory Tester |
| GFab001816 |
Test |
Ergolux |
Ergolux |
Microscope |
| GFab001673 |
Assembly |
ESEC |
2005 LOC |
Automatic Die Bonder |
| GFab001281 |
Assembly |
ESEC |
3006F/X |
ESEC 30006F/X Wire Bonder |
| GFab001336 |
Repair |
ESI |
9800 |
|
| GFab001337 |
Repair |
ESI |
9800 |
|
| GFab001338 |
Repair |
ESI |
9800 |
|
| GFab001339 |
Repair |
ESI |
9800 |
|
| GFab001614 |
Other |
ESI |
9250A |
Laser Semiconductor Processing System, 1996 |
| GFab001613 |
Other |
ESI |
9250B |
Laser Semiconductor Processing System, 1996 |
| GFab001491 |
Assembly |
ESI |
8000/200 |
Laser Processing System |
| GFab001470 |
Repair |
ESI Inc |
9820 |
Laser Repair |
| GFab001340 |
Repair |
Estek |
WIS-800 |
|
| GFab001047 |
Metrology-Test Systems |
Estek Wis |
600 |
Inspection System Wafer Surface Analysis System Capability
3" to 6" wafers. |
| GFab001385 |
Test |
ETS Lindgren |
5407 |
|
| GFab001399 |
Assembly |
Evertech |
UNKNOWN |
|
| GFab001471 |
Assembly |
EVG |
540 G2W |
Die Bonder |
| GFab001393 |
Metrology |
Fein Focus |
F3D-160-10(V) |
Xray |
| GFab001473 |
Assembly |
FICO |
TFM-1A |
Lead Forming Tool |
| GFab001837 |
Test |
FLX2320 |
KLA-TENCOR |
|
| GFab001284 |
Subsystem |
Fortrend |
See Listing |
Fortrend Wafer Transfers |
| GFab001048 |
Metrology-Test Systems |
Four Dimension Movec |
280TC |
Automated 4 Point Probe Capable of 100mm to 200mm wafers |
| GFab001675 |
Wet |
FSI |
8221 |
Spin Rinse Dryer |
| GFab000984 |
Wet |
FSI |
Excalibre |
Vapor Cleaner |
| GFab000985 |
Wet |
FSI |
Excalibre |
Vapor Cleaner |
| GFab001049 |
Photoresist Coaters-Tracks |
FSI Polaris |
1000 |
Microlithography Cluster tool (Coat / Dev) Capability 3"
to 6" wafers |
| GFab001050 |
Photo |
Fusion |
150 PC |
UV systems |
| GFab000850 |
Photo |
Fusion |
150PC-200PCU- Gemini |
Photostablilizers and EPROM erasers (dual application) |
| GFab001225 |
Photo |
Fusion |
200PC |
Photostabilizer |
| GFab001535 |
Photo |
Fusion |
Asher |
|
| GFab001536 |
Photo |
Fusion |
Asher |
|
| GFab001227 |
Photo |
Fusion |
G03 |
Photostabilizer |
| GFab001228 |
Photo |
Fusion |
G03 |
Photostabilizer |
| GFab000854 |
Photo |
Fusion |
M200 PCU |
|
| GFab001454 |
Photo |
Fusion Systems |
PS3 UV Harden |
Photoresist Curing |
| GFab001455 |
Photo |
Fusion Systems |
PS3 UV Harden |
Photoresist Curing |
| GFab001676 |
Test |
GAERTNER |
Stokes LSE |
Ellipsometer, Manual 300MM max |
|
|
|
|
|
|
|
|
|
|
| GFab001053 |
Photo |
Gasonics |
Aura 1000 |
Photoresist Asher 75mm to 150mm wafer capability |
| GFab001054 |
Photo |
Gasonics |
Aura 2000LL |
Loadlock
Asher Configured for 4"- 8" Wafers |
| GFab001055 |
Photo |
Gasonics |
Aura 2000LL |
Loadlock Asher Configured for 4"- 8" Wafers |
| GFab001056 |
Photo |
Gasonics |
L3510 |
Single Wafer Ashing System Substrate Size: 3-8inch /
75mm-200mm |
| GFab001677 |
Test |
GCA/TROPEL |
9000 |
Surface Flatness Analyzer |
| GFab001407 |
Assembly |
GD-Takatori |
1100 |
Gold- Grind |
| GFab001406 |
Assembly |
GD-Takatori |
2100 |
Gold- Grind |
| GFab001583 |
CVD |
Gemini |
Gemini 3 |
Dual Chamber Epitaxial Reactor |
| GFab001285 |
CVD |
Gemini |
Gemini II |
Gemini II EPI Reator (Left Side Controller) |
| GFab001286 |
CVD |
Gemini |
Gemini II |
Gemini II EPI Reator (Right Side Controller |
| GFab001492 |
Assembly |
Genesis |
Tester II |
Tester II |
| GFab001493 |
Assembly |
Genesis |
Tester II |
Tester II |
| GFab001478 |
Assembly |
Geringer |
|
|
| GFab001612 |
Other |
GSI Lumonics |
HM1400L |
Laser Marking system |
| GFab001057 |
Test |
Hach One Laboratory |
Hach One Laboratory
PH/Meter |
| GFab001811 |
CVD |
Hipox |
Gasonics |
w/Haskel Pumps, up to 125mm |
| GFab001386 |
Defect Metrology |
Hirayama |
PC305S III |
|
| GFab001387 |
Defect Metrology |
Hirayama |
PC305S III |
|
| GFab001678 |
Test |
HITACHI |
4500 |
| Analytical
Scanning Electron Microscope |
|
| GFab001810 |
Etch |
Hitachi |
308 ATE |
Poly Etcher |
| GFab001831 |
Test |
Hitachi |
7280H |
|
| GFab001416 |
Etch |
Hitachi |
HI TECH 308 |
Etcher |
| GFab001424 |
Etch |
Hitachi |
HI TECH 308 |
Etcher |
| GFab001419 |
Photo |
Hitachi |
HI TECH 8820 |
|
| GFab001994 |
Test |
HITACHI |
IRG-10-T10 |
REVIEWER |
| GFab001003 |
Metrology |
Hitachi |
IS-2000 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001993 |
Test |
HITACHI |
IS2500 |
WAFER INSPECTION |
| GFab002005 |
Test |
HITACHI |
LS-6030K |
Particle Inspection |
| GFab001983 |
Test |
HITACHI |
S-4160 |
FE-SEM |
| GFab001341 |
Etch |
Hitachi |
S-4500 |
|
| GFab000992 |
Metrology |
Hitachi |
S-6000 |
CD SEM |
| GFab000993 |
Metrology |
Hitachi |
S-6000 |
CD SEM |
| GFab001679 |
Test |
HITACHI |
S-6000 |
Field Emission CDSEM, 2ea Available |
| GFab000995 |
Metrology |
Hitachi |
S-7000 |
CD SEM |
| GFab001680 |
Test |
HITACHI |
S-7000 |
CD SEM Measurement Tool, 2ea Available |
| GFab001479 |
Test |
Hitachi |
S-7800 |
CD SEM |
| GFab001984 |
Test |
HITACHI |
S-8820 |
CD-SEM |
| GFab001527 |
Test |
HITACHI |
S-8820 |
200mm |
| GFab001990 |
Test |
HITACHI |
S-9260 |
SEM |
| GFab001992 |
Test |
HITACHI |
S-9260 |
SEM |
| GFab001515 |
Test |
HITACHI |
SEM S7000 |
|
| GFab001505 |
Test |
HITACHI |
SEM S7800 |
|
| GFab001889 |
Test |
Hitachi |
8820 |
CD Sem |
| GFab001342 |
Other |
Holon |
EMU220 |
|
| GFab001616 |
Test |
Hypervision |
Visionary 2000 |
Emission Microscope |
| GFab001921 |
Etch |
ICF |
|
EKC Wet station |
| GFab001942 |
Wet |
ICF |
|
Tube Cleaner for Vertical furnace |
| GFab001875 |
Etch |
ICP Multiplex |
STS |
Inductively coupled plasma, GaN Bluechip, vintage 2002 |
| GFab001495 |
Assembly |
IMS Tester |
ATS 1271 |
Tester- spare system |
| GFab001494 |
Assembly |
IMS Tester |
ATS 1271 |
Tester-full system |
| GFab000996 |
Metrology |
Inficon |
TRS-H200M |
GAS ANALYZER |
| GFab001480 |
Repair |
Innolas |
IL C 3000 DPS |
Laser YAG |
| GFab001559 |
PVD |
Innotec |
VS 24C |
5 Target DC Sputtering System |
| GFab001861 |
PVD |
Inova |
Novellus |
PVD 200mm |
| GFab001007 |
Metrology |
Inspex |
TPC8500 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001004 |
Metrology |
Inspex |
TPC8520 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001005 |
Metrology |
Inspex |
TPC8525 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001006 |
Metrology |
Inspex |
TPC8525M |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001008 |
Metrology |
Inspex |
TPC8530 |
Total Reflection X-Ray Fluorescence TRXRF |
| GFab001481 |
Test |
Integrated Dynamics Eng |
TC |
Shock Vibration |
| GFab001059 |
Ion Implantors |
Ion Tech Inc |
Sourcerer |
Ion Beam
System Dual Ion Beam Deposition |
| GFab001681 |
Test |
IONIC |
Stressgage |
Wafer Film Stress Tester, 2ea Available |
| GFab000832 |
CMP |
IPEC |
472 / 372M |
Rotational CMP Platforms |
| GFab000835 |
CMP |
IPEC/Speedfam |
Auriga / Auriga C |
5-Head Standalone or Integrated CMP Polisher |
| GFab001682 |
Other |
IRVINE OPTICAL |
Ultrasort 606 |
Robotic Bar Code Reader/Wafer Sorter |
| GFab001683 |
Test |
IRVINE OPTICAL |
UltraSpec |
Wafer Inspection Station with Nikon Optiphot 150 Optics,
NeoPlan2 5X, 20X & 100X Obj |
| GFab001684 |
Test |
IRVINE OPTICAL |
UltraSpec III |
Wafer Inspection Station with Nikon Optiphot, DIC Optics,
Isolation Table |
| GFab001555 |
PVD |
IVI |
Box Coater |
48 inch thermal evaporator |
| GFab001229 |
Metrology |
IVS |
200 |
Wafer Inspection System |
| GFab001685 |
Test |
JEOL |
JSM-6360LV |
Scanning Electron Microscope |
| GFab000991 |
Metrology |
Jeol |
JWS 7505 |
CD CEM |
| GFab001482 |
Test |
JEOL |
JWS 7515 |
Microscope |
| GFab001230 |
Metrology |
JEOL |
JWS 7700 |
CD Sem |
| GFab001686 |
Test |
JEOL |
JWS-7515 |
SEM Based Wafer Inspection Tool |
| GFab001287 |
Assembly |
JLSI |
IPS8653D |
JLSI Test Handler |
| GFab001506 |
Test |
JOEL |
JWS-7700 |
|
| GFab001833 |
Test |
JWS 7515 |
JEOL |
|
| GFab001687 |
Assembly |
K&S |
1472 |
Wire Bonder |
| GFab001688 |
Assembly |
K&S |
6497 |
Semi-Automatic Flip Chip Die Bonder |
| GFab001689 |
Assembly |
K&S |
1470-4 |
Automatic Hybrid Wedge Bonder, 200mm x 200mm Travel |
| GFab001690 |
Assembly |
K&S |
1470-4 |
Automatic Hybrid Wedge Bonder, 100mm x 100mm Travel |
| GFab000936 |
Photo |
Karl Suss |
MA150 |
Mask Aligner |
| GFab001691 |
Mask |
KARL SUSS |
MJB-3 |
Mask Aligner with Split-Field Optics, Model 505 UV Power
Supply |
| GFab001692 |
Other |
KARL SUSS |
RA120M |
Wafer Scriber |
| GFab001060 |
Mask |
Karl Suss |
MA-150ML |
Manual Mask Aligner w/ Video Backside Alignment |
| GFab001061 |
Mask |
Karl Suss |
MA56 |
Mask Aligner Exposure System |
| GFab001062 |
Mask |
Karl Suss |
MA6 |
Mask Aligner / Exposure SystemSystem Capable of 2" to
6" Wafers |
| GFab001063 |
Mask |
Karl Suss |
RA120M |
Scriber |
| GFab001231 |
Assembly |
Kensington |
CSMT-2 |
2 Stage Wafer Sorter |
| GFab001693 |
Other |
KETEK |
RMM 530 |
Manual Load Rubbing
Machine for LCDs |
| GFab001422 |
Other |
Kevex |
771 SEMICRON |
|
| GFab000855 |
Test |
Kevex |
Omicron XRF |
|
| GFab000856 |
Test |
Kevex |
Omicron XRF |
|
| GFab001483 |
Assembly |
Kinergy |
Auto Frame Loader |
Assembly Hybrid |
| GFab001484 |
Assembly |
Kinergy |
Auto Frame Loader |
Assembly Hybrid |
| GFab001064 |
Metrology |
Kinetek |
DRS 200 |
Optical Inspection and Defect Review StationSystem Capable of
4" to 8" Wafers |
| GFab001232 |
Metrology |
KLA |
Fab VARS 500 |
Digital Image Management System |
| GFab001517 |
Test |
KLA |
KLA2552 |
1998 |
| GFab001066 |
Metrology |
KLA |
2131 |
Defect Inspection
System Upgraded to 2132 4" to 8" Water Capability |
| GFab001067 |
Metrology |
KLA |
2132 |
High Speed Multilayer Wafer Inspection for Process Defects |
| GFab001065 |
Metrology |
KLA |
Tencor P20H |
Long Scan Profiler Capability to handle 3" to 8"
wafer |
| GFab001074 |
Metrology |
KLA Tencor |
6200 |
Surfscan Wafer Surface Contamination Analyzer Capable up to
8" Wafers |
| GFab001075 |
Metrology |
KLA Tencor |
6220 |
Surfscan Wafer Surface Inspection System 4" to 8"
Water Capability |
| GFab001076 |
Metrology |
KLA Tencor |
6420 |
Surfscan Unpatterned Surface Inspection System Capable up to 8" Wafers |
| GFab001070 |
Metrology |
KLA Tencor |
Alpha Step 200 |
Profiler System
Capability to handle 3" to 8" wafer |
| GFab001077 |
Metrology |
KLA Tencor |
Flexius FLX 2320 |
Thin Film Stress Measurement System Wafer Sizes:100 to 200mm |
| GFab001078 |
Metrology |
KLA Tencor |
M-Gage 300 |
Non-Contact Mettallization Monitor Capability Capability
2" to 6" wafers |
| GFab001071 |
Metrology |
KLA Tencor |
P2 |
Long Scan Profilometer Sample Size: up to 200 mm |
| GFab001080 |
Metrology |
KLA Tencor |
Surfscan 354 |
Capability 2" to 5" wafers |
| GFab001081 |
Metrology |
KLA Tencor |
Surfscan 4500 |
Surface Particle Inspection Analyzer Capability 3" to
6" wafers |
| GFab001082 |
Metrology |
KLA Tencor |
Surfscan 5500 |
Surface Particle Inspection Analyzer Capability 4" to
8" wafers |
| GFab001069 |
Metrology |
KLA Tencor |
Surfscan 7000 |
Pattern particle and microscan |
| GFab001083 |
Metrology |
KLA Tencor |
Surfscan 7200 |
Patterned Wafer Particle Inspection SystemSubstrate Size:
4"to 8 |
| GFab001084 |
Metrology |
KLA Tencor |
Surfscan 7700 |
Surfscan Patterned / Unpatterned Wafer Inspection System |
| GFab001072 |
Metrology |
KLA Tencor |
TF1 |
Film Thickness Measurement System Substrate Size: 4" to
8" |
| GFab001073 |
Metrology |
KLA Tencor |
TF2 |
Film Thickness Measurement System Capability 100 to 200mm
wafer |
| GFab001085 |
Metrology |
KLA Tencor |
UltraPointe 1010 |
Laser Imaging System Defect Review Station- Capable of 4"
to 8" Wafers |
| GFab001897 |
Test |
KLA 2132 |
controller |
Controller |
| GFab001898 |
Test |
KLA 91 |
|
|
| GFab001235 |
Metrology |
KLA TENCOR |
2135 |
Wafer Defect Inspection System |
| GFab001233 |
Metrology |
KLA TENCOR |
HRP 100 |
Profilometer |
| GFab001989 |
Test |
KLA Tencor |
es20XP |
Wafer Inspection |
| GFab001237 |
Metrology |
KLA TENCOR |
eS20XP |
Electronic Beam Wafer Inspection |
| GFab001239 |
Metrology |
KLA TENCOR |
eS20XP |
Electronic beam wafer inspection |
| GFab002004 |
Test |
KLA Tencor |
FLX-5200H |
Stress Guage |
| GFab001234 |
Metrology |
KLA TENCOR |
HRP 220 |
Inspection System |
| GFab001986 |
Test |
KLA Tencor |
KLA-2132 |
Particle Inspection |
| GFab001991 |
Test |
KLA Tencor |
KLA-5300 |
MASK WAFER INSPECTION |
| GFab001238 |
Metrology |
KLA TENCOR |
P20 |
Profile Measurement |
| GFab001236 |
Metrology |
KLA TENCOR |
Quantox |
In-Line Electrical Measurement System |
| GFab001977 |
Test |
KLA Tencor |
SFS-7000 |
Surfscan |
| GFab001996 |
Test |
KLA Tencor |
SURFSCAN AIT-1 |
WAFER INSPECTION |
| GFab000857 |
Test |
KLA-Tencor |
2132 |
|
| GFab001623 |
Test |
KLA-Tencor |
5000 |
Coherence Probe Metrology |
| GFab001835 |
Test |
KLA-TENCOR |
5105 |
|
| GFab000858 |
Test |
KLA-Tencor |
5200 |
|
| GFab000860 |
Test |
KLA-Tencor |
6200 |
|
| GFab001412 |
Metrology |
KLA-Tencor |
6200 |
Surface Scanner |
| GFab000861 |
Test |
KLA-Tencor |
6220 |
|
| GFab000862 |
Test |
KLA-Tencor |
6220 |
|
| GFab001836 |
Test |
KLA-TENCOR |
6400 |
|
| GFab001840 |
Test |
KLA-TENCOR |
7700 |
|
| GFab000863 |
Test |
KLA-Tencor |
7700 |
|
| GFab000864 |
Test |
KLA-Tencor |
7700 |
|
| GFab000865 |
Test |
KLA-Tencor |
7700 |
|
| GFab000859 |
Test |
KLA-Tencor |
5200XP |
|
| GFab001841 |
Test |
KLA-TENCOR |
7700M |
|
| GFab001420 |
Metrology |
KLA-Tencor |
ABI 2000 |
|
| GFab001418 |
Metrology |
KLA-Tencor |
AIT |
|
| GFab001694 |
Test |
KLA-TENCOR |
AlphaStep 300 |
Profilometer |
| GFab001415 |
Metrology |
KLA-Tencor |
CRS-1010S |
|
| GFab001695 |
Test |
KLA-TENCOR |
CRS-3000 |
Confocal Review Station for up to 300mm Wafers |
| GFab001343 |
Test |
KLA-Tencor |
ev300 |
|
| GFab001584 |
Test |
KLA-Tencor |
Flex-5200h |
Automated Thin Film Stress Measurement |
| GFab001586 |
Test |
KLA-Tencor |
HRP-220 |
High Resolution Profiler |
| GFab001436 |
Metrology |
KLA-Tencor |
KLA 2135 |
|
| GFab001433 |
Metrology |
KLA-Tencor |
KLA 3800L |
|
| GFab001012 |
Metrology |
KLA-Tencor |
KLA2130 M/B |
WAFER INSPECTION |
| GFab001013 |
Metrology |
KLA-Tencor |
KLA2130/2111 OPERATION RAC |
| GFab001014 |
Metrology |
KLA-Tencor |
KLA2130/2111 OPERATION RAC |
